Apparatus and method for the remote monitoring, viewing and control of a semiconductor process tool

ABSTRACT

A precision pump system having a motor driver for accurately and repeatedly delivering process fluid, (e.g., photo chemicals) using a pumping fluid with minimal process fluid loss to a fabrication process and whereby the motor driver can be easily and quickly replaced without interrupting the fluid flow path. This is accomplished with the use of a process fluid reservoir and a pumping fluid reservoir that are associated with the pump, either integrated with the pump or closely adjacent. In addition, this precision pump system can be remotely monitored, viewed and controlled over the Internet. In addition, trapped process fluid within a downstream filtering block can be recirculated to the process fluid reservoir when trapped gas in the filter is removed. Furthermore, a nitrogen gas source is connected to the process fluid reservoir via a valve in case a need to insert a gas is required.

CROSS-REFERENCE TO RELATED APPLICATIONS

This international application claims the benefit under 35 U.S.C.§119(e) of Provisional Application Ser. No. 61/789,217 filed on Mar. 15,2013 entitled PUMP HAVING A QUICK CHANGE MOTOR DRIVE SYSTEM and whoseentire disclosure is incorporated by reference herein.

BACKGROUND OF THE INVENTION

The present invention relates generally to apparatus used in meteringfluids with high precision, particularly in fields such as semiconductormanufacturing.

Many of the chemicals used in manufacturing integrated circuits,photomasks, and other devices with very small structures are corrosive,toxic and expensive. One example is photoresist, which is used inphotolithographic processes. In such applications, both the rate andamount of a chemical in liquid phase—also referred to as process fluidor “chemistry”—that is dispensed onto a substrate must be veryaccurately controlled to ensure uniform application of the chemical andto avoid waste and unnecessary consumption. Furthermore, purity of theprocess fluid is often critical. Even the smallest foreign particlescontaminating a process fluid cause defects in the very small structuresformed during such processes. The process fluid must, therefore, behandled by a dispensing system in a manner that avoids contamination.See, for example, Semiconductor Equipment and Material International,“SEMI E49.2-0298 Guide for High Purity Deionized Water and ChemicalDistribution Systems in Semiconductor Manufacturing Equipment” (1998).Improper handling can also result in introduction of gas bubbles anddamage the chemistry. For these reasons, specialized systems arerequired for storing and metering fluids in photolithography and otherprocesses used in fabrication of devices with very small structures.

Chemical distribution systems for these types of applications thereforemust employ a mechanism for pumping process fluid in a way that permitsfinely controlled metering of the fluid and avoids contaminating and/orreacting with the process fluid. Generally, a pump pressurizes processfluid in a line to a dispense point. The fluid is drawn from a sourcethat stores the fluid, such as a bottle or other container. The dispensepoint can be a small nozzle or other opening. The line from the pump toa dispense point on a manufacturing line is opened and closed with avalve. The valve can be placed at the dispense point. Opening the valveallows process fluid to flow at the point of dispense. A programmablecontroller operates the pumps and valves. All surfaces within thepumping mechanism, lines and valves that touch the process fluid mustnot react with or contaminate the process fluid. The pumps, containersof process fluid, and associated valving are sometimes stored in acabinet that also house a controller.

Pumps for these types of systems are typically some form of a positivedisplacement type of pump, in which the size of a pumping chamber isenlarged to draw in fluid into the chamber, and then reduced to push itout. Types of positive displacement pumps that have been used includehydraulically actuated diaphragm pumps, bellows type pumps, pistonactuated, rolling diaphragm pumps, and pressurized reservoir typepumping systems. U.S. Pat. No. 4,950,134 (Bailey et al.) is an exampleof a typical pump. It has an inlet, an outlet, a stepper motor and afluid displacement diaphragm. When the pump is commanded electrically todispense, the outlet valve opens and the motor turns to force flow of adisplacement or actuating fluid into the actuating fluid chamber,resulting in the diaphragm moving to reduce the size the pumpingchamber. Movement of the diaphragm forces process fluid out the pumpingchamber and through the outlet valve.

Due to concerns over contamination, current practice in thesemiconductor manufacturing industry is to use a pump only for pumping asingle type of processing fluid or “chemistry.” In order to changechemistries being pumped, all of the surfaces contacting the processingfluid have to be changed. Depending on the design of the pump, thistends to be cumbersome and expensive, or simply not feasible. It is notuncommon to see processing systems that use up to 50 pumps in today'sfabrication facilities.

A dispensing apparatus that supplies process chemicals from differentsources is shown in U.S. Pat. No. 6,797,063 (Mekias). Here, thedispensing apparatus has two or more process chambers inside of acontrol chamber. The volume of the process chambers increases ordecreases by adding control fluid to or removing control fluid from thecontrol chamber. The use of valving at the inlets and outlets of theprocess chambers, in combination with a pressurized fluid reservoir thatcontrols fluid into and out of the control chamber controls the flow ofdispensed fluid through the process chambers.

One highly desirable feature of a precision pump not heretofore known isthe ability to separate and remove components of the pump formaintenance or repair without breaking into the process fluid flow linesthat are attached to one or more pump chamber heads. This would includeavoiding opening of any seals in the process fluid flowpath either into,through, or out of the pump. U.S. Pat. No. 8,317,493 (Laessle, et al.),assigned to the same Assignee, namely, Integrated Designs L.P., as thepresent invention, discloses a precision pump system having just such afeature.

However, where a new pump motor needs to replace an existing motor,there remains a need to provide for immediate pumping fluid restorationand balancing within the pump head and pumping chamber, while notinterrupting the process fluid flow and while minimizing the loss of anyprocess fluid.

All references cited herein are incorporated herein by reference intheir entireties.

BRIEF SUMMARY OF THE INVENTION

An apparatus for remotely monitoring and controlling the operation of atool (e.g., a pump) in a semiconductor manufacturing process over anetwork is disclosed. The apparatus comprises: at least one computer,remotely-located from the tool, in communication with the network,wherein the computer comprises a web browser for communicating over thenetwork; tool electronics that are in communication with the network;and a web server for establishing communication between the at least onecomputer and the tool electronics over the network when the at least onecomputer identifies the tool.

A method for remotely monitoring and controlling the operation of a tool(e.g., a pump) in a semiconductor manufacturing process over a networkis disclosed. The method comprises: (a) coupling at least one computer,remotely-located from the tool, to be in communication with a networkand wherein the computer comprises a web browser for communication overthe network; (b) coupling tool electronics to be in communication withthe network; and (c) establishing communication between the at least onecomputer and the tool electronics over the network using a web serverwhen the at least one computer identifies the tool.

BRIEF DESCRIPTION OF SEVERAL VIEWS OF THE DRAWINGS

The invention will be described in conjunction with the followingdrawings in which like reference numerals designate like elements andwherein:

FIG. 1 is a block diagram of the present invention coupled to anexemplary integrated circuit wafer fabrication process;

FIG. 2 are isometric views of the precision pump assembly of the presentinvention;

FIG. 3 is an exploded view of the precision pump assembly of the presentinvention;

FIG. 4 is an exploded view of the pump body;

FIG. 4A is an isometric view of the pump body showing the side thatforms the pumping fluid reservoir;

FIG. 4B is an isometric view of the pump body showing the side thatforms the pumping fluid chamber;

FIG. 5 are isometric views of the pump head and showing how it couplesto the pump body;

FIG. 6 is an exploded view of the pump head;

FIG. 6A is an isometric view of the pump head block showing the processfluid chamber side of the pump head block;

FIG. 6B is an isometric view of the pump head block showing the processfluid reservoir (also referred to as the “pre-reservoir”) and the sideof the pump head block that mates with the valve plate;

FIG. 6C diagrammatically shows the process fluid reservoir inlet;

FIG. 7 is an exploded view of the filter distribution block;

FIG. 7A are front and back views of the assembled filter distributionblock;

FIG. 8 is an exploded view of the motor drive system;

FIG. 8A is a plan view of the piston;

FIG. 8B is a cross-sectional view of the piston assembly taken alongline 8B-8B of FIG. 8A

FIG. 9 are exploded and assembled views of the piston;

FIG. 10 is a cross-sectional view of the piston cylinder;

FIG. 11 are exploded and isometric views of the overall pump assembly;

FIG. 11A is an isometric view of the pump assembly showing internals ofthe pump in phantom and with the outer cover removed showing theconnections of the various flare fittings;

FIG. 12 is an exemplary electrical wire harness (also referred to aspigtail) for use in the electronics of the present invention;

FIG. 13 is an exemplary syringe device for coupling to the presentinvention for adding air into the pumping fluid reservoir during themotor drive system change;

FIG. 13A is a block diagram of the remote monitoring, viewing andcontrolling (RMVC) subsystem pump interface using a web server;

FIG. 13B is a block diagram of the RMVC subsystem pump interface of FIG.13A but using power-over-Ethernet (POE);

FIG. 13C is an exemplary web cam that can be used to view the pump andits vicinity over the RMVC using the web server in the system of FIG.13B;

FIG. 13D is a block diagram of the RMVC subsystem pump interface of FIG.13B but using POE and WiFi;

FIG. 13E is a block diagram of the network management module (NMM)interface;

FIG. 13F is a block diagram of the pump controller motherboardinterfaces;

FIG. 13G is a block diagram of the Assignee's (Integrated Designs, L.P.)standard graphical user interface (GUI) for the pump;

FIG. 13H is a block diagram of the Assignee's standard GUI modified forEthernet input/output;

FIG. 13I is a block diagram of the Assignee's standard GUI and pump overthe Ethernet;

FIG. 13J is a block diagram of the Assignee's preferred cross-platformGUI, served JAVA applet;

FIG. 13K is a block diagram of the RMVC (also referred to as “Lynx”)which is a web-served cross platform GUI;

FIG. 13L is a table showing the JAVA supported platforms for use withthe preferred GUI;

FIG. 14 is a circuit schematic of a conventional stepper motor H-bridge;

FIG. 15 block diagram of another embodiment of the present inventioncoupled to an exemplary integrated circuit wafer fabrication processthat provides valving for filter recirculation of trapped process fluidand for a process fluid reservoir nitrogen supply;

FIG. 15A depicts a venturi circuit for use in the alternative embodimentof FIG. 15 to support filter recirculation of trapped process fluid;

FIG. 16A is a flow diagram for the Recirculation mode using theembodiment according FIGS. 1-1A;

FIG. 16B is a flow diagram for the Recirculation mode using theembodiment according FIG. 15;

FIG. 17 is a flow diagram for the Auto Balance mode;

FIG. 18 is a flow diagram for the Dispense and Recharge modes;

FIG. 19 is a flow diagram for the Precharge mode;

FIG. 20 is a flow diagram for the Purge to Vent mode;

FIG. 21 is a flow diagram for the Purge to Output mode;

FIG. 22 is a flow diagram for the Prime Filter Housing mode;

FIGS. 23A-23B form a flow diagram for the Prime Filter Substrate mode;

FIGS. 24A-24B are flow diagrams for the System Drain mode using atwo-filter block design;

FIGS. 24C-24D are flow diagrams for the System Drain mode using afour-valve filter block design;

FIG. 25A is a flow diagram for the Out of the Box mode using atwo-filter block design;

FIG. 25B is a flow diagram for the Out of the Box mode using afour-filter block design;

FIG. 26 is the flow diagram for the Changing Drive Assembly mode;

FIGS. 27A-27B form a flow diagram for the Gas in Filter DetectionAlgorithm;

FIGS. 28A-28B form the flow diagram for the Gas in Piston ChamberDetection Algorithm;

FIGS. 29A-29B form the flow diagram for the Gas Volume in Process FluidReservoir Detection Algorithm;

FIG. 30 is a block diagram of the major features of the presentinvention;

FIG. 31 depicts an alternative configuration of the pump of the presentinvention wherein the filter is located before the pre-reservoir and therecirculation is located upstream of the filter;

FIG. 32 depicts another alternative configuration of the pump of thepresent invention wherein the filter is located after the pre-reservoirand the recirculation is located either upstream of the pre-reservoir ordownstream of the pre-reservoir; and

FIG. 33 depicts another alternative configuration of the pump of thepresent invention wherein the filter is located before the pre-reservoirand where the recirculation is located downstream of the filter.

DETAILED DESCRIPTION OF THE INVENTION

The invention will be illustrated in more detail with reference to thefollowing embodiments, but it should be understood that the presentinvention is not deemed to be limited thereto.

Referring now to the drawings, wherein like part numbers refer to likeelements throughout the several views, there is shown a block diagram ofan exemplary embodiment of the present invention 20 that uses aprecision pump system. The present invention 20 may form a portion of anintegrated circuit wafer fabrication process, by way of example only,for dispensing a precise amount of process fluid to the waferfabrication. As shown in FIG. 1, the present invention 20 is coupled tofabrication equipment, e.g., a fabrication reservoir FR which in turn isconnected to a BIB (“bag in bottle” which supplies process fluid to thefabrication reservoir); a vent/drain is connected to the fabricationreservoir FR via a valve, V_(FAB).

As shown in FIGS. 1-2, the present invention 20 comprises a precisionpump system 22 which includes a motor drive system 24 (e.g., AllegroA3977SED stepper motor driver and Portescape PK264-E2.0A stepper motor)that drives a piston 26 within a piston cylinder or chamber 28. Theprecision pump 22 drives a pumping fluid (e.g., ethylene glycol or anyother similar liquid that comprises similar characteristics, such asvapor pressure, boiling point, etc. that remains in its liquid stateduring all aspects of present invention's operation). The pumping fluidis also referred to as the “working” fluid because of how it interactswith the piston 26 and the operation of the pump 20 as a whole. Thepumping fluid is provided from a pumping fluid reservoir 32 (e.g., 33 mLcapacity) associated with the precision pump system 22. The pumpingfluid is used to drive and deliver a process fluid (e.g., photoresist)to the exemplary wafer fabrication process. The process fluid isprovided from a process fluid reservoir 30 (also referred to as“pre-reservoir”, and which has an exemplary capacity of 33-34 mL). Theprocess fluid is a premium fluid and minimizing its waste is one of thekey features of the present invention 20 which is to deliver preciseamounts (e.g., maximum of 11 mL) of this process fluid without wastingit. To accomplish this delivery of the process fluid, both the pumpingfluid and the process fluid are delivered to a working chamber 34 thatcomprises a pumping chamber 34A (e.g., 11-13 mL capacity) and a dispensechamber 34B (e.g., 11-13 mL capacity, and also referred to as “processfluid chamber”) which are formed by the presence of a diaphragm 36 thatdivides the working chamber 34 into the two variable sized chambers34A/34B. Thus, the two fluids do not come into contact with each otherand when the piston 26 is pressurizing the pumping fluid within thepumping chamber 34A, the corresponding pressure is conveyed through thediaphragm 36 to the process fluid present in the process fluid chamber34B. The process fluid is then conveyed to filter distribution block 40which comprises a filter 42 for filtering the process fluid beforedispensing it to the application.

It should be noted that a pump controller 38, as will be discussed indetail later, controls a motor drive assembly 24E for displacing thepiston 26; the motor drives the piston 26 based on pressure readings ofthe piston chamber 28 using a pressure sensor PS. Since the pumpcontroller 38 knows the rate at which the piston 26 moves, as well asthe time required to displace a desired volume of fluid, the preciseamount of fluid dispensed is known.

It should also be understood that the presence of the associated pumpingfluid reservoir 32 and the process fluid reservoir 30 form two keyelements of the present invention 20. By having the pumping fluidreservoir associated with the precision pump 22, the present invention20 is able to accomplish a quick replacement of the motor drive systemwhile the pump remains online during the switch out. Alternatively, byhaving the process fluid reservoir 30 associated with the precision pump22, dispensed process fluid contains no gas bubbles and thus the processfluid reservoir 30 can also be termed a “gas removal reservoir.” Thesereservoirs also permit the quick priming of the precision pump 22 andthe filter distribution block 40 for the newly-inserted motor drive 24.It should be understood that the location of either of these twoassociated reservoirs 30/32 may be integrated within the pump assembly22A/pump head 22B (see FIG. 3), or may be external to either of thosecomponents. The important feature is the presence of each of thesereservoirs 30/32 in close proximity to the present invention 20 permitsthe present invention 20 to perform advanced operations in a closedinternal fluid loop with only a single piston and a single pumpingstage.

It should be further understood that filling of the process fluidreservoir 30 from the fabrication reservoir FR can occur at the top ofthe process fluid reservoir 30 or at the bottom of the process fluidreservoir 30, etc. FIG. 1 depicts the process fluid reservoir 30 andfilter 42 using orientation notation to show one alternative where fluidcouplings to the top of those devices are being used.

A pump controller (e.g., a microprocessor, microcontroller, etc.; e.g.,a Freescale MC9S12DG128CPVE microcontroller) 38 is coupled to the motordriven system 24, as well as each of the valves 1-12 to achieve theprecise delivery of the process. By way of example only, the valves 1-8and 10-12 may comprise diaphragmatic type valves (which are alsoreferred to as diaphragmatic integrated valves, DIVs); valve 9 is adigital valve rather than a diaphragmatic valve. A bleed port valve BP1is provided with the pumping fluid reservoir 32 and a bleed port valveBP2 is provided with the pumping chamber 34A; the importance of thosevalves will be discussed later. In addition, a pressure sensor PS isprovided for detecting the pressure within the piston cylinder 28 aswill also be discussed later. Operation of these diaphragmatic valvesare discussed below under Diaphragmatic Integrated Valves. It should befurther noted that control of the valves pertaining to the process fluidreservoir 30 and the pumping fluid reservoir 32 by the microcontroller38 is not limited to an integrated controller within the pump system 20.It is within the broadest scope of the invention to include a remotecontroller of the valves associated with those two reservoirs.

Another key aspect of the present invention 20 is the ability tomonitor, view and control the present invention 20 over a local areanetwork (LAN), via wired (e.g., via an Ethernet connection, etc.) orwireless connection (e.g., Bluetooth, IEEE 802.11, etc.). This isaccomplished via a network management module (NMM) 50, which includes,among other things, a web server microcontroller (e.g., FreescaleMCF52235CAL60 microcontroller). As will be discussed in detail later,the NMM 50 permits the precision pump system 20 to be monitored remotelyand in real-time, as well as, to permit remotely-controlling the system20. The remote location includes a display controlled by a graphicaluser interface (GUI) that allows the operator to remotely monitor, viewand control the operation of the precision pump system 20. This remotemonitor, view and control subsystem is hereinafter referred to as theremote monitoring, viewing and controlling (RMVC) subsystem, which isdiscussed below under Remote Monitoring, Viewing and Controlling (RMVC)Subsystem.

FIG. 2 is an isometric view of the present invention 20 showing theprecision pump system 22 and an electrical control box 23 which housesthe electronics that control the pump 22, including the microcontroller38 and the NMM 50 discussed previously.

FIG. 3 depicts the internals of the pump system 22. The filterdistribution block 40 is mountable behind a front plate 25. Besides acoupling on the front plate 25, there is a maintenance button 25A thatis activated to initiate the motor drive 24 removal; in particular,activation of the maintenance button 25A opens isolation valve 8. As canbe seen, the motor drive 24 sits atop a main pump assembly 22A and themotor drive 24 can be released from the main pump assembly via theremoval of four screws 24A-24D which can most easily be seen in FIG. 4.FIG. 3 depicts the pump body assembly 22A, pump head 22B, a pneumaticvalve manifold 44, a cover plate 46 (see FIG. 4) to the pumping fluidreservoir 34A (FIG. 4B) and a pressure sensor board 48 (FIG. 11), whichincludes the pressure sensor PS (e.g., Honeywell ASDXRRX100PD2A5 digitalpressure sensor) and a pressure sensor board microcontroller (e.g.,Microchip PIC12F675-E/SN).

Pump Body 22A

The precision pump system 20 incorporates a unique design of a singlestage pump with the use of two associated reservoirs, namely, theprocess fluid reservoir 30 (also referred to as the “pre reservoir”) andthe pumping fluid reservoir 32, allowing the pumping fluid and theprocess fluid to be stored and accessed on an as needed basis. Thisallows the pump system 20 to perform operations in a closed internalfluid loop with only a single piston. A prior art closed loop systemfilled with and facilitating the movement of incompressible workingfluid requires the increase and decrease using two or more pump stagesto create an imbalance of pressure to induce flow. The decrease in thevolume of one chamber must be equaled by the increase in volume ofanother connected chamber. The passively variable volume of the chambers(i.e., 28, 34A and 34B) in the present pump system 20 allows for apartially closed system, the volume of the total sealed space isconstant but the shape of the fluid filled portions of the pump canchange with the amount of fluid contained in the particular chamber.

As shown in FIG. 4, the pump body 22A comprises aluminum (by way ofexample only, machined to 6.15″×2.20″×2.20″). The front face 52Afeatures a machined slot 54 for an anti-rotation guide 56 on the piston26 to travel in. Around this slot 54 are four threaded holes formounting the pressure sensor PS and associated printed circuit board 48,which also contains an infrared (IR) sensor that interfaces with theanti-rotation guide 56 on the piston 26. This front face 52A alsofeatures a tubing connection 58A/58B that taps into the piston chamber28 inside the pump body 22A. The other end of this tubing 60 (FIG. 11)connects with the pressure sensor PS on the pressure sensor PCB 48. Thispressure sensor PS is used for calibration and balancing of the pumpingfluid levels in the pump body 22A.

On a left face 52B of the pump body is the pumping fluid reservoir 32(see FIGS. 4 and 4A) that is machined to house extra pumping fluid thatis used in the maintenance operations of the pump 20. There is an O-ringgroove 115 machined around the perimeter of this chamber to allow analuminum plate 46 to seal against this face 52A of the pump body 22A,thus completing the reservoir 32 for the pumping fluid. This sealingplate 46 is mounted to the pump with six screws 62 that secure intothreaded holes around the perimeter of this face of the pump body 22A.

The back face 52C of the pump body 22A includes the pumping fluidchamber 34A (see FIGS. 4 and 4B) machined with an O-ring groove 63 (FIG.4B), to seat an O-ring 65 (FIG. 4), around the perimeter to properlyseal the diaphragm 36 (e.g., a PTFE diaphragm, see FIG. 4) against itwith the use of a diaphragm hold down plate 64. This aluminum diaphragmhold-down plate 64 has a cut-out in the center that mimics the shape ofthe process fluid chamber 34B. This allows the diaphragm 36 to expandand contract through it while still having material over the O-rings toseal the diaphragm 36 to the pump body face 52C. This back face 52C ofthe pump body 22A features eight threaded holes for the counter-sunkscrews 66 that secure the diaphragm hold-down plate 64 to it. It alsofeatures six larger diameter screw holes for mounting the pump head 22B(see FIG. 5) into position on the face 52C. There are through holes inboth the hold-down plate 64 and the diaphragm 36 to accommodate thefourteen mounting screws required for the hold-down plate 64 and thepump head 22B. At the top right of this back face 52C, there is athreaded hole for a flow path that leads into the top of the pumpingfluid reservoir 32. This pathway acts as the bleed port, i.e., BP1, usedin the motor change procedure and in balancing the pumping fluid levelsin the pump 20. Under normal operation (when the pumping fluid reservoir32 is not in use), a screw BP1 (FIG. 4) is secured in this hole to sealthe reservoir 32 from atmospheric pressure.

The right face 52D (FIG. 4) of the pump body 22A only has one feature.This is an angled cutout 53 (FIGS. 4 and 4B) that features a threadedhole that feeds into a flow path to the top of the pumping fluid chamber34A. This acts as the bleed port BP2 for the pumping fluid chamber 34A.This threaded hole is sealed off by a screw 109. This screw 109 does notbe need to be removed for any user-performed maintenance.

The top face 52E of the pump body 22A features four threaded holes forthe stepper motor 24 to be mounted with four bolts 24A-24D. In thecenter of this face is a multi-diameter hole (FIG. 10). The first andlargest diameter (e.g., 1.505″) is machined to a depth of, for example,0.25″ and is only necessary for the seating of the stepper motor 24. Thenext diameter (e.g., 1.125″) is to provide clearance for the lead screwclamp and the anti-rotation guide 56 as they spin and travel within thishole, and is machined to a depth of 2.938″. The next diameter (0.75″) isthe actual piston bore of the pump body 22A, machined to a depth of,e.g., 5.188″. This has an 8 RMS finish with electroless nickel boronplating to improve the hardness and prevent wear from the piston andacts as the sealing face for the piston 26. The bottom of this pistonbore has a 60 degree chamfered edge to fit perfectly with the conicalshape of the piston at its maximum stroke. The last diameter is 0.5″ andgoes to a depth of approximately 5.875″. There are two flow paths thatenter this final section. One leads to the front of the pump body 22Aand is connected to the pressure sensor PS on the pressure sensor PCB48. Off of this flow path another splits off to go to the isolationvalve, valve 8, on the bottom of the pump body 22A that controls flow tothe pumping fluid reservoir 32. The second flow path from the finalsection goes directly to the other isolation valve, valve 5, on thebottom face of the pump body 22A that controls flow to the pumping fluidchamber 34A.

The bottom face 52F of the pump 22A has two integrated valves (5 and 8)machined into it. These are designed similarly to the otherdiaphragmatic valves throughout the pump 22A. Valve 8 controls flowbetween the piston chamber 28 and the pumping fluid reservoir 32 andvalve 5 controls flow between the piston chamber 28 and the pumpingfluid chamber 34A. There is an aluminum valve plate 68 (FIG. 4) thatholds a PTFE diaphragm 70 (FIG. 4) against the two O-rings 72 around thevalve cutouts on the pump body 22A. This aluminum valve plate 68 issecured to the pump body with 4 screws 72 (FIG. 4). There are also fourrubber mounting pads 74 (FIG. 4) secured around the valve plate 68 tokeep the pump body 22A stable.

Isolation Valves V5 and V8

Isolation valves 5 and 8 are used in the pump system 20 to control theflow of the pumping fluid between the three pump fluid chambers 28, 32and 34A. The valves allow the pump 22 to store and access additionalpumping fluid on an as needed basis. Since only one isolation valve isopen at any given time, this arrangement insures that only one flow pathfrom the piston chamber 28 is active at that same time. Flow from thepiston chamber 28 to the pumping fluid reservoir 32 does not affect thepumping chamber 34A and vice versa.

Reservoir For Incompressible Fluid Used in Motion Transfer

Fluid movement in a closed system filled entirely of incompressiblefluid from one chamber to another requires the individual chambervolumes to be varied in conjunction with the fluid flow. It isimpossible to adjust the normal holding volume of one chamber withoutdirectly and proportionally changing the normal holding volume ofanother. When this is desired, the only option is to incorporate an opensystem to allow the fluid volume to be altered. When a repeatable andreversible change in system volume is desired, the use of a reservoirallowing the fluid to be stored can be used to allow the fluid movementto and from the system while preventing any compressible fluids into theoriginal system.

In order to allow the pump system 20 to perform maintenance functionswith minimal physical disturbances to the pump 22 and pumped processfluid (e.g., photo chemical), a reservoir 32 for the incompressiblefluid used in motion transfer, i.e., the pumping fluid, is incorporatedinto the pump body 22A. This reservoir 32 is capable of storing volumesof temporarily unused pumping fluid. During various maintenancefunctions, the reservoir 32 is used to both temporarily store pumpingfluid from the piston chamber 28 and to create a fluid barrier toprevent air bubble entrapment in the pumping fluid channels inside thepump body 22A.

The pumping fluid reservoir 32 is connected to the piston chamber 28through an integrated diaphragmatic valve, 8. This valve 8 remainsclosed during the normal pumping process to prevent fluid movement intoand out of the reservoir 32 to maintain a constant volume of pumpingfluid used in the piston chamber 28 and pumping fluid chamber 34A.During normal pumping processes the reservoir 32 simply stores pumpingfluid that will be needed during the maintenance functions. Thereservoir 32 is sealed from atmosphere by the pumping fluid reservoirbleed port screw BP1 and is filled to roughly half capacity duringnormal pumping operations. The fluid in the reservoir 32 is exposed tothe air sealed inside the reservoir 32, but is unaffected by this gasdue to the fluid's resistance to absorbing gas.

During maintenance processes, the reservoir bleed port screw BP1 isremoved to allow the ingress and egress of air from the reservoir 32.This allows the pumping fluid levels to be altered while maintainingpressure equalization with atmospheric pressure. This ensures that noresidual pressure differentials in the reservoir 32 will cause unwantedfluid flow to or from the rest of the pump 20. After the completion ofthe maintenance function the pumping fluid reservoir bleed port screwBP1 is re-installed to seal the reservoir 32.

During a head auto-balancing process, the pumping fluid normally in thepiston chamber 28 is dispensed into the pumping fluid reservoir 32 andthe valve 8 isolating the pumping fluid reservoir fluid from the pistonchamber 28 is then closed. This frees room in the piston chamber 28 toallow the piston 26 to move pumping fluid from the pumping fluid chamber34A as needed. Once the desired pumping fluid volume has been reached inthe pumping fluid chamber 34A, the valve 8 isolating the reservoir 32opens, allowing the flow of pumping fluid from the reservoir 32 to thepiston chamber 28. As the piston 26 returns to the home position, thefluid flows from the reservoir 32 into the piston chamber 28, completelyrefilling it.

During the drive assembly change, the valve V8 isolating the reservoir32 is opened allowing the pumping fluid normally held in the reservoir32 to flow into the piston chamber 28. This flow is caused by thesuction created by the O-ring seal as the piston 26 is removed. The factthe fluid path from the pumping fluid reservoir 32 to the piston chamber28 is attached to the bottom of the reservoir 32 means that only thepumping fluid flows in the fluid paths inside the pump unless thereservoir 32 is completely empty. This prevents any gaseous bubbles fromentering the internal fluid paths and other pumping fluid chambers.

Drive Assembly

The motor drive assembly 24 (FIG. 8) comprises a stepper motor 24E, abearing 24F, a lead screw 24G clamped onto the motor shaft by a clamp24H, and the piston 26 (FIG. 9). During assembly, the bearing 24F ispressed onto the stepper motor 24E (e.g., using 80-90 PSI). Thestainless steel lead screw 24G is then installed onto the motor driveshaft and clamped into place. Grease is applied to the threads on thelead screw 24G and the piston 26 is screwed on. The stepper motor 24E isplugged into the pressure sensor PS PCB 48 that is mounted on the sideof the pump body 22A.

The piston (FIGS. 8A-8B) features two O-rings 74 (FIG. 9) to keep thepiston 26 properly aligned in the piston cylinder 28 of the pump body22A and to better retain grease along with a proper seal. The bottomface 76 (FIG. 8) of the piston 26 is machined to be a conical shape.This shape aids in preventing air from being trapped in the pistoncylinder 28 during initial assembly and during a drive changemaintenance procedure. There is a piston wiper ring 77 (FIG. 9)installed above the two O-rings 74 to keep debris out of the grease andthe piston chamber 28. An anti-rotation guide 56 is installed at the topof the piston 26 to serve as a restraint that keeps the piston 26 fromturning as the motor 24E turns the lead screw 24G. The guide 56 travelsin a machined slot 54 (FIGS. 4 and 4A) on the front face 52A of the pumpbody 22A. It is this anti-rotation guide 56 that converts the rotationmotion of the piston 26 into reciprocating motion. This guide 56 alsoacts as a flag for the IR sensor mounted on the PCB 48 on the front faceof the pump body 22A. When this flag is in between the prongs of the IRsensor, the pump software in the microcontroller 38 knows the piston 26is at the home position (HRP).

Conical Piston Shape to Displace Fluid and Bleed Air Out of the PistonChamber During Insertion

The pump system 20 relies of the absence of air in the pumping fluidchamber 34A to achieve highly repeatable and controllable dispenses. Airin the pumping fluid chamber 34A expands and contracts to anunacceptable degree due to the pressure changes that occur during thedispense cycle. To ensure no air remains in the piston bore 28 after thedrive assembly changing process, the use of a piston 26 with conicallyshaped end 76 is incorporated into the pump 20. The addition of aninverted conical shape 76 to the piston 26 assures that any air isevacuated prior to the first O-ring sealing 74 with the piston bore.

When the piston 26 is to be reinserted into the piston bore 28 of thepump 22A, the pumping fluid level inside the piston bore 28 is justbelow a horizontal plane formed by the uppermost circumference of thepiston bore 28. As the piston 26 is lowered into the piston bore 28, theconical shape 76 of the piston end displaces a volume of the pumpingfluid in the piston bore 28. As the piston 26 lowers, the volume ofdisplaced pumping fluid increases and causes the fluid level to rise inrelation to the pump body 22A. The volume of the conical shape of thepiston end is greater than the volume of the air initially located abovethe pumping fluid and below the plane formed by the upper section of thepiston bore 28. Since the volume of displaced liquid is larger than thevolume of air, the fluid rises to the point it fills the entire volumelocated below the O-ring sealing surface of the piston bore 28.

The volume of the conical shape is sufficient to displace the air belowthe sealing surface, while not causing an undue amount of spillage fromany excess pumping fluid being forced out of the piston bore 28. Theconical shape 76 is important to the evacuation of air since the angledface directs any bubbles already floating in the piston chamber 28 upand out of the piston bore 28. The outward angle face of the conicalpiston works in conjunction with the buoyant nature of gas bubbles toevacuate all gasses from the volume sealed by the O-rings 74 against thepiston bore 28.

Pump Head 22B

The pump head is depicted in detail in FIGS. 6-6C. The pump head (FIG.6) consists of a PTFE block 78 and an aluminum valve plate 80. The PTFEblock 78 contains the process fluid chamber 34B on one face along withfour diaphragmatic integrated valves (1, 2, 3, and 7) and the processfluid reservoir 30 (also referred to as the “Pre-Reservoir”) on theopposite face. There are four flow paths in and out of the process fluidreservoir 30, as shown in FIGS. 1 and 1A. These flow paths connect tothe process fluid source 10 (e.g., fabrication reservoir), the filtervalve block 40, and the process fluid chamber 34B on the opposite faceof the head PTFE block 78. The process fluid chamber 34B is cut into theface of the PTFE block 78 that interfaces with the pump body 22A. Thischamber 34A is in the shape of an elongated rectangle with circularends. There is a raised edge around this chamber to support an O-ring.The diaphragmatic valve cutouts on the opposite face of the PTFE block78 are designed as those described in the Diaphragmatic IntegratedValves section below. As shown most clearly in FIG. 6B, the processfluid reservoir 30 is cut into the same face as the valves 1, 2, 3 and7. It is shaped as a square but with one vertical edge longer than theother to create a high point in the chamber 30 that aids in bubblecollection and venting. The process fluid source inlet is positioned onthe roof of the process fluid reservoir where the side wall meets theroof on the shorter vertical side. The purpose of the source inlet'sposition is to allow for the process fluid to enter into the processfluid reservoir at an angle near the side edge which allows for theprocess fluid to smoothly run down the wall of the process fluidreservoir instead of dripping from the top of the reservoir, which cancause the capturing of air as the fluid falls. There is a raised edgearound the reservoir 30 that is similar in profile to those thatsurround the integrated valves 1, 2, 3 and 7. Four flow paths exit thePTFE block 78 through ¼″ male flare fittings on the top face. Two ofthese lines are connected to the filter valve block 40 and the other twogo to the process fluid chamber 34B and the process fluid source 10.Four set screws 82 hold the male flare fittings securely in place in theblock 78. FIG. 11 depicts how the pump head 22B and the pump body 22Aare mated together.

The aluminum valve plate 80 (FIG. 6) features four valve cutouts,mirrored to the valve cutouts on the corresponding surface 80A (FIG. 6B)of the PTFE block 78, and an O-ring cutout 30A that lines up with theraised edge around the reservoir 30 on the PTFE block 78. The valvecutouts on the aluminum plate 78 are designed similarly to thosedescribed in the diaphragmatic integrated valves section below. Thealuminum valve plate 80 holds the O-rings for valves 1, 2, 3 and 7 aswell as for the process fluid reservoir 30. In between the aluminumvalve plate 80 and the PTFE block 78, there is a PTFE diaphragm 84 (FIG.6) similar to that described in the diaphragmatic integrated valvessection below. The pieces are assembled and secured to the pump headusing six screws 86 (FIG. 6) that travel through the whole assembly andfasten to the pump body 22A.

Diaphragmatic Integrated Valves

The present invention 20 is designed to take up minimal space to allowthe customer to optimize the space available in the coater/developerwhere the pump 20 is installed. The valves used throughout the pumpsystem play a major role in reducing its footprint. Off-the-shelf valvestend to take up too much space. The valves in the pump system of thepresent invention 20 are low profile diaphragm valves that are designedright into the pump head 22B. The following discussion pertains to thediaphragmatic valves uses in the pump head 22B, it being understood thatdiaphragmatic valves used elsewhere in the present invention have asimilar construction.

The valves and associated flow paths are machined into the virgin PTFEblock 78, allowing the pump 20 to perform a variety of complexoperations in a very small amount of space.

The basic diaphragmatic integrated valve design consists of three parts:a PTFE block, a PTFE diaphragm, and an aluminum plate. The PTFE blockcontains the flow paths and the circular valve chambers for the processfluid to flow through. The aluminum plate serves as a manifold todistribute the air required for the pneumatic actuation of the valves,having flow paths and circular chambers that minor the valve chambers onthe PTFE block. The PTFE diaphragm is the interface between the PTFEblock and the aluminum plate and is forced into either the PTFE block'schambers or the aluminum plate's chambers by positive or negativepressure from the pneumatic lines, respectively.

The valve design on the PTFE block side involves a shallow circularcutout on the face of the block, and has both an inlet and outlet flowpath that connect with this circular chamber. On the block facesurrounding the circular cutout, there is a raised lip to provide abetter sealing surface with the diaphragm against the aluminum plate.One of the two flow paths that intersect with the valve cutout isusually located near the center of the circle to allow the diaphragm toeffectively seal the path when it is pushed into the valve cutout bypneumatic pressure from the other side.

The diaphragm is made of 0.01″ thick PTFE sheets and is cut to the sizeof the sealing face of the valve block. Any holes needed for mountingvalve blocks are cut in the diaphragm sheet to allow bolts and screws topass through. The thickness of the PTFE diaphragm allows it to bedeformed by the pneumatic pressure and vacuum to fill the cutoutchambers in the PTFE block and aluminum plate, respectively.

The aluminum plate is designed with circular cutouts on the face thatmates with the valve face of the PTFE block. These cutouts are placed tominor the cutouts on the PTFE block, creating a valve chamber that isbisected by the diaphragm when the parts are assembled. O-ring groovesare machined around the valve cutouts on the aluminum plate for theraised lips around each valve cutout on the PTFE block to seal against.Each valve cutout on the aluminum block interfaces with one flow path inwhich pressurized air travels through. The flow paths containing thepressurized air travel through the aluminum plate and are finished witha fitting that allows the connection of nylon tubing. This tubing isconnected to a separate valve manifold with a bank of 3-way valves thatcontrol the application of either pressure or vacuum to each of thevalves in the pump system individually.

To understand operation of the diaphragmatic valve, FIGS. 6-6A depictthe construction of DIV valves 1, 2, 3 and 7, it being understood thatall of the DIV valves operate in a similar manner. As can be seen inFIG. 6, the control side of the DIV (e.g., valve 7) is on plate 80 whichcomprises a control port CP (e.g., an air port) surrounded by a channelCH into which an O-ring 81 is disposed. A diaphragm 84 is disposed inbetween plate 80 and surface 80A of the block 78. As can be seen in FIG.6B, surface 80A of the block 78 comprises the “output” portion of theDIV 7 which comprises two outlet ports 83A/83B. Operation of thediaphragmmatic valve involves connecting the control port to a pneumaticsource where either a pressure or vacuum is applied. When pressure isapplied, the diaphragm closes the two outlet ports and conversely whenvacuum is applied the diaphragm opens the two outlet ports.

Process Fluid Reservoir's 30 Seal:

As shown most clearly in FIG. 6, the process fluid reservoir 30 issealed by a PTFE diaphragm cover and a metal plate with an integratedO-ring groove on it. The process fluid reservoir 30 has a raised ridgeproviding support to the PTFE diaphragm cover around the edge for bettersealing. The back metal plate provides uniform support to the processfluid reservoir PTFE diaphragm cover and ensures no leakage around theO-ring sealing. Table 1 is a definition of the various DIVs:

TABLE 1 DIV Valve Numbers and Description Diaphragmatic Integrated ValveNumber Diaphragmatic Integrated Valve Description 1 Inlet-Process FluidReservoir 30 2 Outlet-Process Fluid Reservoir 30/Inlet- Pump 3Outlet-Pump/Inlet-Filter 4 Recirculation Valve 5 Pumping Chamber34A-Isolation Valve 6 Filter Vent/Drain 7 Process Fluid Reservoir30-Drain 8 Pumping Fluid Reservoir 32-Isolation Valve 9 Digital valve(customer supplied) 10 Filter recirculation (see FIG. 15) 11 InternalRecirculation Shut-off (see FIG. 15) 12 Process Fluid Reservoir 30 N₂Supply (see FIG. 15)

External Valve Block/Filter Block 40

The pump system 20 utilizes valves and valve controls to direct fluidflow during the various maintenance, startup, and operating processes.This must be achieved while maintaining the compact size of the pumprequired by the spaces in which they are mounted. To meet theaforementioned requirements, some of the diaphragmatic valves areincluded in a small external block (FIG. 7). This block directs fluidflow to and from six connections 175 (FIG. 7). The valve block includesconnections from filter vent connection, from the filter fluid outputline, to the external dispense digital valve, to the pump system drainline, from the process fluid reservoir vent line, and to the processfluid reservoir recirculation line. The fluid flow is controlled by fourpneumatically-actuated integrated diaphragmatic valves 177 (FIG. 7). Onevalve (DIV 6) controls the fluid flow from the filter vent connection tothe system drain/vent line. One valve (DIV 10) controls the fluid flowfrom the process fluid reservoir recirculation line to the systemdrain/vent. One valve (DIV 4) controls the fluid flow from the filteroutput to the process fluid reservoir. One valve (DIV 11) controls thefluid flow from filter output line to the point of the external dispensedigital valve. Those valves direct fluid flow during each operation withfilter involved. FIG. 7A shows the assembled filter block.

Pneumatic Valves and Manifold 44

A bank of three-way pneumatic valves 44 (FIGS. 3 and 11) is used tocontrol the application of pressure or vacuum to the integrated valvesused throughout the pump 20. The preferred embodiment uses 8 SMC V100valves mounted on an SMC 8-position manifold. This manifold has 2 mainflow paths that run the length of it. One path is for pressure and theother is for vacuum. These flow paths are capped at one end by 2 M5 capscrews, and have 2⅛″ tubing barb fittings screwed into the other end.The SMC valves are mounted on the front face of the manifold, which hasthe proper ports necessary to interface with these valves. On the top ofthe manifold are 8 SMC ⅛″ tubing fittings that run to each of the eightintegrated valves used throughout the pump system 20. Each SMC valve onthe manifold has access to the common pressure and vacuum rails, butaccesses only one of the eight ports out to the integrated valves. Thepressure and vacuum lines to the manifold are connected from the panelconnectors located on the pump enclosure 22. The user need only need toconnect fab pressure and vacuum source lines to the connectors on pumpenclosure 22. FIG. 11A depicts the connections of the various flarefittings.

Quick Disconnect Electronics:

The electronics are made to be easily replaced simply by loosening theenclosure attachments & unplugging the connectors on the pump controllerpigtails. (FIG. 12).

Electronics Enclosure 23

The electronics enclosure 23 (FIG. 2) is designed to house the maincontroller PCB 530 (FIG. 13C), network management PCB 50 (FIG. 13C), RDStranslator PCB 539 (FIG. 13C), and optional digital valve controller PCB538 (FIG. 13C). These boards are encapsulated by a two-piece sheet metalcasing. The enclosure is designed to be mounted next to the pumpenclosure and is easily removable from the mounting plate in the trackwithout disturbing the pumping hardware. The enclosure allows for theconnection of network cables, power cables, track communication cables,and an N₂ line. Cable connectors are external to the enclosure to alloweasy removal of the electronics enclosure from the track. The enclosureis accented by stickers that display connection labels, model numbers,and brand logos.

Pump Enclosure

As shown most clearly in FIG. 3, the pump enclosure 22 comprises fivestainless steel sheet metal pieces: a base plate 165, a bottom enclosure167, a cover 173, an access panel 169, and a filter manifold bracket248. The purpose of the pump enclosure 22 is to house and protect thepump parts. The enclosure 22 features fluid connections for the sourceinput, dispense output, and drain lines. The enclosure 22 also allowsfor the connection of the pump power and control wires as well asconnections for N₂, pressure, and vacuum lines. The pump enclosure issecured to a track mounting plate 243, next to the electronics enclosure23. The filter manifold bracket 248 features mounting holes in a varietyof different configurations to allow the user to mount multiple types offilter brackets (see Filter Manifold Bracket section below). There is apush button switch 25A installed on the front of the enclosure to ensurethe user is present when performing certain maintenance functions on thepump. The pump enclosure includes indicia (e.g., stickers) to identifythe model number and to label the incoming and outgoing connections.

Track Mounting Plate 243

The stainless steel sheet metal track mounting plate 243 (FIG. 3) allowsthe electronics enclosure 23 and the pump enclosure 22 to be installedside-by-side in the track. The track mounting plate 243 comprises amounting-hole pattern for other pumps (e.g., Entegris RDS pump). Thepattern of the mounting holes on the plate is symmetric so that theplate 243 can be installed upside down without changing the mountingorientation of the pump enclosure 22 and electronics enclosure 23. Theplate 243 allows the electronics enclosure 23 to be removed from thetrack without removing the pump 22 or vice versa. The symmetry of theenclosure mounting holes also allows the electronics enclosure 23 to beinstalled to either the right or the left of the pump enclosure,depending on the user's preference. There are PEM keyhole fasteners onone side of the track mounting plate 243 for securing screws that mountthe enclosures to it.

Filter Manifold Bracket 248

The stainless steel sheet metal filter manifold bracket 248 (FIG. 3) haspredrilled mounting holes for attaching three different OEM filtermanifolds. These preconfigured hole patterns allow for the attachment ofeither other components, such as, but not limited to, Entegris Impact 2,Entegris ST, or Pall EZD-3 filter manifold.

Bleed Port Syringe

During a drive system change, the user is prompted to remove the pumpingfluid reservoir bleed screw BP1 and attach a provided syringe (FIG. 13).This syringe is used to push air into the pumping fluid reservoir 32while valve 8 is open, thus pushing pumping fluid into the pistonchamber 28. The extra pumping fluid fills the piston chamber 28 to allowthe insertion of a new motor drive assembly 24. The provided syringeapparatus comprises, by way of example only, a 15 cc luer lock tipsyringe, a luer lock to 1/16″ tubing coupling, and a tubing with 6″ inlength and 1/16″ in ID. These pieces come assembled with the replacementpumping chamber diaphragm parts. As shown in FIG. 13, the syringe 222comprises a 20 cc (by way of example only) Luer Lock tip, a tubecoupling 263, Luer Lock to 1/16 inch tube (by way of example only) and atube 264 that is 1/16 inch by 4 inches long (again, only by way ofexample).

Remote Monitoring, Viewing and Controlling (RMVC) Subsystem

As discussed previously, the pump system 20 is software controlled inall aspects of the pump operation, including the dispense parametermonitoring, maintenance prediction and control, as well as the setup andcontrol of normal pumping operations. The pump controller 38 (FIG. 1)performs these functions through various interfaces not shown. Thenetwork management module 50 (FIG. 1) allows Ethernet or wirelessnetwork control of the pump through the microcontroller 38. In a simplerembodiment the pump controller 38 is directly connected to aspecifically programmed graphical user interface (GUI) via a serialinterface. The RMVC subsystem is also referred to by its tradename“Lynx”.

FIG. 13A shows an embodiment of the pump of the present invention 20having a graphical user interface (GUI) connected over a network, e.g.,Ethernet, local area network (LAN), wide area network (WAN), a virtualprivate network (VPN), the “cloud,” the Internet or an Intranet. This isachieved via a web server WS that is connected to the pump controller 38via the network management module NMM 50 to form a “web-served GUI.” Inparticular, the web-served GUI incorporates an Ethernet communicationvia an RJ45 connection. The web server WS is a small surface mountcomponent on the NMM 50 housed in the pump 20 and is used for pumpconfiguration, operation and monitoring using a standard web browser.All pump configuration parameters are entered and read using thisinterface. The web server WS communicates with the pump 20 on serialporta The web server WS may comprise megabytes of flash memory suitablefor web page storage. Hence, the web-served GUI is also referred to asthe “remote monitoring, viewing and controlling (RMVC) subsystem.

As shown in FIG. 13B, the web server WS may be enhanced with anadditional Ethernet port for use with an optional networked device.Power-Over-Ethernet (POE) may be used to supply power to an optionalnetworked device, e.g., a web cam. This Ethernet port is not used by theweb server WS. The optional web cam may be used to observe the pump 20operation remotely. It should be noted that the web cam is controlled bysoftware supplied therewith. FIG. 13C depicts an exemplary web cam, suchas the Wireless IP Network Camera Pan Tilt WIFI Webcam CCTV IR Night USAPlug 80413 by Yaloocharm.

FIG. 13D depicts a block diagram of the web server interface that isenhanced with an additional, built-in, Wireless Ethernet port for usewhen the network cable would be inconvenient.

FIG. 13E shows a block diagram of the NMM 50. As mentioned previously,the NMM 50 includes the web server WS having a web servermicrocontroller 501 with embedded Ethernet engine, a CanBus driver(Controller Area Network bus) 502, a 2 port Ethernet switch 503, flashmemory 504 and a Power over Ethernet (POE) power supply and controller505. An exemplary device for the web server microcontroller is theFreescale MCF52235CAL60 microcontroller.

Motherboard Interfaces

As shown in FIG. 13F, the motherboard 530 of the pump controller 38includes a central microcontroller, which is responsible for all of thesystem control functions. The microcontroller is connected to the pumpstepper motor through the stepper motor drive 532. The microcontrolleris connected to the valve drivers 533 and pressure sensor/PCBelectronics 48 via a serial connection. In the embodiment depicted, thepressure sensor electronics include a separate microcontroller whichmonitors pressure and sends this data to the central pump controller 38.As stated above, the central microcontroller is also connected to theNMM 50, which allows GUI control of the pump process through theInternet either via Ethernet or WiFi wireless connection. The pumpcontroller 38 is also optionally connected to a digital valve controller536 for control of up to three valves. The pump controller 38 is alsooptionally connected to the RDS translator module 539, an externalRS232/485 converter 537 and a track I/O daughter card 538.

GUI Options

A first GUI option is a standard singe platform installed GUI, blockdiagrams of which are shown in FIGS. 13G-13I. The standard GUI may bemodified for use with the tiny web server WS. This GUI is still a singleplatform and the GUI requires installation on the client machine.

A second more preferred GUI is the cross platform JAVA virtual machineGUI, block diagrams of which are shown in FIGS. 13J-13L. In particular,as compared to the first GUI option, the second GUI option is a moreflexible GUI when written as a JAVA applet. This applet may be servedfrom the tiny web server WS and utilizes the JVM (JAVA virtual machine)runtime libraries. These runtime libraries are part of the JVM. JVMsupported platforms, as shown in FIG. 13L, that can serve as potentialGUIs are: Windows® (x86-64, IA-64 processors), Solaris® (x86-64, SPARCprocessors), Linux® (x86, x86-64, IA-64, PowerPC, System z (formerlyZ-Series) processors), HP-UX (PA-RISC, IA-64 processors); i5/OS and AIX(both PowerPC® processors).

An exemplary operational description is as follows:

-   -   1) Open a web browser and input the pump's Internet Protocol        (IP) address;    -   2) The GUI, written as a JAVA applet is served to the web        browser from the tiny web server WS;    -   3) The JAVA applet is executed in the web browser's JVM;    -   4) The GUI, as written, appears in the web browser;    -   5) Data fields may be read and/or changed and these updates are        sent to the tiny web server WS over Ethernet via UDP; the tiny        web server WS converts the UDP (user datagram protocol) commands        to the Assignee's ASCII serial protocol equivalent and updates        the pump. Using UDP allows an unlimited number of “listeners on        the data connection.” This is useful for multiple people        observing and for automatic data logging devices such as the        Assignee's “Failsafe” product.

As to the GUI's internal firmware, this may be updated in four ways:

-   -   1) via a flash update plug: this method requires physical access        to the pump electronics in addition to a laptop with a BDM        (background debug mode) flasher;    -   2) via a full web update: this process may be used when there is        a network connectivity to the Assignee's update servers. This        option does not require physical access to the pump electronics;        and    -   3) via a request update: the user in the RMVC interface simply        clicks on the “Program update” option the program firmware is        downloaded and programmed from the Assignee servers; and    -   4) Via an automatic setting: If the user had previously selected        “Automatic Program Updates”, then the RMVC system downloads and        programs the firmware whenever an update is available.

It should be noted that an internal network update is also available. Inparticular, this option may be used when there is no networkconnectivity to the Assignee update servers. This option does notrequire physical access to the pump electronics. This option is similarto “Full Web update” described above except an update folder isspecified on the internal network instead of the Assignee's updateserver.

The RMVC subsystem adds additional value by being able to provide adirect camera and audio connection between a technician working with ourpump and our field service workers. As mentioned previously, anexemplary camera and audio device is the Wireless IP Network Camera PanTilt WIFI Webcam CCTV IR Night USA Plug 80413 by Yaloocharm (as shown inFIG. 13C).

a. Video Camera for use in yellow light (semi FAB) environment

b. Yellow camera light for use with a video camera in a yellow light(semi FAB) environment.

c. Wide range pan, tilt, zoom, lights, focus, audio, for unattendedremote control operation.

To operate this feature, the FAB tech clicks “Request Service” Button inNMM GUI. This sends a Service request to the IDI remote service center.IDI Field service personnel acknowledge the request & initiate a remoteconnection with “service” credentials. At this time the IDI remoteservice center personnel have full, remote control, of all of the videocamera, & pump controls. Audio may be enabled to discuss the issue withthe FAB tech. FAB safe video camera lights may be activated & thecamera's pan, tilt, and zoom can be manipulated to observe any pumpmalfunction. The IDI service personnel may operate the pump whileobserving its operation. With the proper credentials, anyone can jointhe audio/video feed & manipulate the pump or just observe & listenwhile the diagnosis & repairs are being made.

It should be understood that the RMVC subsystem can be used an unlimitednumber of pump devices and that its integration with the pump system ofthe present invention 20 is by way of example only. The RMVC subsystemcan be used, by way of example only, for any process equipment used in awafer fabrication facility, or in medical facilities, or in oil and gasfacilities, or in food processing facilities and even in cosmeticfacilities.

Chambers as Compared to Reservoirs

As mentioned previously, the two reservoirs associated with the pumpsystem 20 are the process fluid reservoir 30 and the pumping fluidreservoir 32 (FIG. 1). These are referred to as reservoirs since theyhave a set volume capacity. The three chambers on the pump system 20 arethe process fluid chamber 34B, the pumping fluid chamber 34A, and thepiston chamber 28 (FIG. 1). These are referred to as chambers becausetheir volume can change. The pumping fluid chamber and process fluidchamber volumes can change as the diaphragm 36 moves around inside thepumping chamber 34. The pumping chamber 34 is the chamber where thepumping chamber diaphragm 36 is mounted. The overall combined volume ofthe two chambers, the pumping fluid chamber 34A and the process fluidchamber 34B, remains constant, but because of the flexible PTFEdiaphragm component 36, the individual chamber volumes may change. Thepiston chamber 28 has a dynamic volume since the piston moves around andaffects a change of volume.

Pump Chambers Piston Chamber, Pumping Fluid Chamber, and Pumping FluidReservoir

The pumping fluid in the single head pump system 20 is primarilycontained in two chambers (i.e., piston chamber 28 and pumping chamber34A) and one reservoir 32 associated with the pump body 22. The first ofthe three pumping fluid chambers houses the piston 26 and the pistonbore 28. In the pump system, mechanical energy is converted from thestepper motor 24E that assists the piston 26 in creating a reciprocatingmotion in piston chamber 28. The second chamber is the primary pumpingfluid chamber 34A that is responsible for transferring the work done bythe piston 26 through the pumping fluid to the diaphragm 36, whichexpands or contracts with the motion of the piston 26. The pumping fluidreservoir 32 stores the pumping fluid that is unused during normaldispense actions, as well as assists in the prevention of air bubblesfrom entering into the other pumping fluid chambers. The remainder ofthe pumping fluid resides in the fluid paths connecting the twochambers/one reservoir as well as the valves located along these fluidpaths. The integrated pneumatically operated diaphragmatic valves 5 and8 control the fluid flow from the piston chamber to the other twochambers (see isolation valves 5 and 8).

How the Process Fluid Chamber Changes Volume to Pump Fluid:

The present invention pump system 20 uses the incompressible pumpingfluid as a medium to transmit the motion of the piston 26 to a rigidchamber 34 (FIGS. 1 and 1A) split with an internalPolytetrafluoroethylene (PTFE) diaphragm 36. The rigid nature of thischamber coupled with the flexibility of the diaphragm 36 causes theportion of the chamber in the pump head (see pump head section) toincrease and decrease in process fluid volume proportionally with thepumping fluid volume. The pump head portion of the chamber 34B is filledwith process fluid that the user intends to dispense. Since the processfluid is incompressible, fluid flow is affected as the available chambervolume changes.

Pump Head 22B

How the pump 22 actually pumps the fluid:

The pump 22 can dispense a variety of chemical fluids. The fluid beingdispensed, as mentioned previously, is referred to as the process fluidand the flow of this process fluid is controlled by the pneumaticallyoperated diaphragmatic integrated valves (1, 2, 3 and 7). These DIVs arelocated on both process fluid paths connected to the process fluidchamber 34B. Process fluid dispenses are caused by closing DIV 1 and DIV2 and opening DIV 3 in the line while the pumping fluid flows into thepumping fluid chamber 34A. The pump 22 finishes its dispense procedureby “recharging” the process fluid reservoir 30 from which it made thedispense by closing DIV 3 and opening DIV 1 and DIV 2 while the pumpingfluid flows out of the pumping fluid chamber 34A. This process isrepeated to cause a controlled fluid flow. The head portion 34B of theprocess fluid chamber has a total of two fluid paths connecting it withan external valve block 40 and the associated process fluid reservoir30. All fluid paths from the head portion of the process fluid chamberare controlled through the DIV valves.

Process Fluid Reservoir 30:

As mentioned previously, the pump system 20 includes the process fluidreservoir 30. This reservoir 30 is used to prevent air from entering theprocess fluid chamber 34B of the pump head 22B. The addition of air inthe process fluid chamber 34B would induce a delay in fluid flow. Sinceair is a compressible gas, the air expands and compresses absorbing someof the volumetric changes in the pump head process fluid chamber 34B andprevents the fluid flow from equaling the volumetric change. The fluidpath between the associated process fluid reservoir 30 and the processfluid chamber 34B connects the bottom sections of both chambers.

How the Head 22B Keeps Air Out of the Process Fluid Chamber:

The process fluid pools at the bottom of the process fluid reservoir 30(also referred to as the “pre reservoir”) while any air will float tothe upper section of the reservoir 30, preventing the inclusion of airin the process fluid chamber. The upper section of the process fluidreservoir 30 is shaped so as to concentrate the rising bubbles to asingle point (see FIGS. 1A and 6-6B). The removal of the air bubbles isaided by a process that expels, or purges, a small amount of liquid intothe fluid path connected with the uppermost portion of the process fluidreservoir. This fluid path leads to a drain line and is closed duringall normal operations of the pump system.

External “Out” Paths:

The process fluid reservoir 30 has a total of four fluid paths (FIG. 1)connecting it with the process fluid chamber 34B, the drain line, thefluid source FR connection of the pump system 20, and an external valveblock 40. The connections to the process fluid chamber drain line andfluid source are routed through the pneumatically operated diaphragmaticvalves to control flow. Fluid flow through the fluid inlet from theexternal valve block is controlled by a valve located in the externalblock. This means that a separate valve inside to the pump head is notneeded.

Process Fluid Reservoir's 30 Shape:

The reservoir's cross sectional area is shaped as a quadrilateral (seeFIGS. 6-6B) with the bottom face oriented along a horizontal plane, thetwo parallel sides oriented along a vertical plane and an angled upperface. The intersections of all the faces of the reservoir incorporate aradius to prevent atmospheric bubbles from collecting in the corners.The intersection points of the three fluid paths on the upper face areintended to aid the evacuation of atmospheric bubbles. In order fromclosest to furthest from the horizontal bottom face are the fluid sourceconnection, the fluid inlet from the external block, and finally thedrain line connection. The source inlet is the lowest to ensure bubblescannot travel into this connection while the fluid in this path is notmoving. The fluid inlet from the external valve block is the next lowestconnection. During the startup procedure the fluid traveling throughthis path will fill the line and carry any atmospheric bubbles out ofthe path. The highest connection is the drain line. The angled face ofthe reservoir ensures any air displaced during the startup and purgingprocedure will collect directly beneath the drain connection.

Valve Sequencing for Operation-Microcontroller 38 Operation Dispense:

The dispense (FIG. 18) starts from the pre-charge position and beginswhen the pump 22 receives a trigger signal. The DIVs 3, 5, 11 and theexternal dispense valve 9 (e.g., the IDI Digital Valve) are opened andthe motor 24E moves the piston 26 down to the user specified volume.This position is designated as End of Dispense (EOD). When EOD isreached, the valves are closed and the pump 22 begins the automaticprocedure to fill itself by completing the “Recharge” operation.

Recharge:

The recharge (FIG. 18) starts by opening the valve 1 separating processfluid from the source inlet and process fluid reservoir inlet, the valve2 separating process fluid the chamber and the process fluid reservoir,and the valve 5 separating pumping fluid from the piston chamber 26 andthe pumping fluid chamber 34A. Driven by the motor 24E, the piston 26moves back to the home reference position (HRP) which creates a negativepressure in the process fluid chamber 34B and “recharges” or fillsprocess fluid from the process fluid reservoir 30. At the same time, theprocess fluid reservoir 30 is fed process fluid through valve 1 that issupplied by the fabrication reservoir FR. All other valves remain closedwhen the recharge takes place. When the recharge operation is completeall valves are closed.

Precharge:

The pre-charge (FIG. 19) begins after any operation that lets the pump22 return to a “ready”, PSO status such as after a Recharge or afterexiting “Maintenance Mode”. The pre-charge opens valves 2 and 7 andmoves the piston forward 26 (down) to push a predetermined amount (e.g.,3 mL) of pumping fluid through the vent line. This action allows thehigh pressure developed due to valve closures to be pushed out throughthe source line to lower the pressure and then closes valves 2 and 7.The piston 26 moves forward to begin building up pressure to a userdefined pressure (e.g., +1.0 psi). This is done by moving the steppermotor 24E in proportion to the pressure error from actual pressure todesired pressure. Once the user-defined pressure is reached, the pump 22returns a ready status and is in a loop checking for pressurefluctuations. If the pump 22 raises or lowers to +/−15% of the desiredpressure, the pump 22 corrects the pressure by moving the piston 26forwards or backwards to achieve the specified pressure. This actionallows the pump to always start the dispense from the same pressurepoint providing extremely consistent dispense performance.

Purge to Vent (Prime Process Fluid Reservoir 30):

Purge to Vent (FIG. 20) is an operation that pulls fluid from the sourcereservoir into the pump 22 and purges the air out of the process fluidreservoir 30 and the source line tube. This operation must be completedwhile the pump is in “Maintenance Mode”, and is accomplished byactivating the “Purge to Vent” command from the “Maintenance” window, inthe Purge tab of the GUI (of the remote monitoring/control subsystem) orby clicking on the “purge to vent” button in the “Purge” operation dropdown list under the “Maintenance” tab of the RMVC subsystem. Thiscommand is a manual input that can be specified to run infinitely or torun a specified number of cycles. A cycle includes one purge to the ventline and one recharge. The pump 22 begins this procedure by checking ifthe piston is at HRP. If the piston 26 is at HRP, then it begins thepurge to vent process. If the piston 26 is not at HRP, then the pump 22recharges until the piston 26 reaches the HRP. This recharge isidentical to the standard Recharge procedure discussed previously. Oncethe piston 26 is at the HRP, the pump 22, with valve 5 open, opensvalves 2 and 7 and moves the piston 26 down to the 11 mL mark. The pump22 then closes valves 2 and 7 and performs a Recharge by opening valves1 and 2 and moving the piston 26 back to HRP. The pump 22 repeats thisprocess until the designated number of cycles has been completed oruntil the user stops the operation. Once this operation is done, whencomplete the pump is ready for the user to exit “Maintenance Mode” whichbegins the Pre-charge operation.

Priming the process fluid reservoir 30 first from the source gives thepump 22 enough fluid to start recirculation using only the liquid in theprocess fluid reservoir 30. This allows the pump 20 to run multiplecycles of the recirculation to gather as many bubbles in the reservoiras possible without wasting any fluid of out the vent line.

Purge to output (Prime Process Fluid Chamber 34B):

Purge to Output (FIG. 21) is an operation that pulls fluid from thesource reservoir into the pump 22 and purges the air out of the sourceline tube and the process fluid chamber 34B. This operation must becompleted while the pump 22 is in “Maintenance Mode” and is achieved byactivating the “Purge to Output” command from the “Maintenance” window,in the Purge tab of the GUI of the RMVC subsystem or by clicking on the“purge to output” button in the “Purge” operation drop down list underthe “Maintenance” tab in the RMVC subsystem. This command is a manualinput that can be specified to run infinitely or to run a specifiednumber of cycles. A cycle includes one purge to the output or dispensesline and one recharge. The pump 22 begins this procedure by checking ifthe piston 26 is at HRP. If the piston is at HRP, then it begins thepurge to output process. If the piston 26 is not at HRP, then the pump20 recharges until the piston 26 reaches the home position. Thisrecharge is identical to the standard Recharge procedure from above.Once the piston 26 is at HRP, the pump 26, with valve 5 open, opensvalve 3 and moves the piston 26 down to the 11 mL mark. The pump thencloses valve 3 and performs a Recharge by opening valves 1 and 2 andmoving the piston 26 back to HRP. The pump 22 repeats this process untilthe designated number of cycles has been completed or until the userstops the operation. When complete, the pump 22 is ready for the user toexit “Maintenance Mode” which begins the Pre-charge operation.

Initial Priming without BIB Pump Initially Primed

PPRM2 (Prime Filter Housing; FIG. 22):

The present invention pump system 20 incorporates a filter attachmentwhich helps to reduce trapped air bubbles in the process fluid line. Thefilter housing is primed by the following procedures. Step 1: A maximumdispense volume proceeds with piston 26 moving from home position to thefurthest position in piston chamber 28; the valve 3 controlling processfluid flow from pumping fluid chamber 34A to filter inlet, the valve 6controlling the process fluid flow from the filter vent to the externaldrain line, and the valve 5 separating pumping fluid between the pistonchamber 28 and process fluid chamber 34B are open; all other valvesincluding the external digital valve 9 at the dispense line remainclosed. This allows process fluid only to pass through the filterhousing and exit from the filter vent line. Step 2: The followingrecharge from the source line takes place with valves 1, 2, and 5 openand valves 3, 4, 6, 7 and 8 remain closed. The external digital valve 9can be at any state, open or closed. The recharge is at maximum rechargevolume with a full stroke motion of the piston chamber 28. The action ofstep 1 and 2 are repeated until process fluid comes out of the filtervent line without air bubbles.

PPRM3 (Prime Filter Substrate; FIGS. 23A-23B):

The filter substrate 42 has to be wetted for proper operation of thefilter and to remove all of the air from the filter can be primed viathe following “prime filter substrate” function. The filter substrate 42can be primed by the following steps. Step 1: Valves 3, 4, 5, and 7 areopen; valves 1, 2, 6, and the external digital valve 9 remain closed.That allows process fluid to enter into the filter 42 from the processfluid chamber 34B and to emerge from the filter 42 via the filter outputport and into the pump filter recirculation line. The process fluid inthe recirculation line then enters into the process fluid reservoir 30and continues through the process fluid reservoir vent/drain line.During this priming process, the maximum dispense volume is used, 11 mL,as the piston moves from the HRP to the 11 mL end of dispense (EOD). Thepump then “recharges from source” by opening DIV 1, 2, 5 and closing DIV3,4, 6,7,8, and 9 and retracting the piston from EOD to HRP. Step 1 isrepeated one more time, for a total of two times. The next operation ofthe PPRM3 functions executes is step 2. Step 2 starts by opening DIV 3,4, 5, and 7 (FIG. 11A) and closing DIV 1, 2, 6,8 and valve 9 and pushes11 mL of process fluid into the filter 42 from the process fluid chamber34B. The process fluid then exits the filter out of the filter outputport and continues into the recirculation line, which leads back to theprocess fluid reservoir 30 while air is pushed out of the process fluidvent/drain. The pump then “recharges from process fluid reservoir 30” byopening DIV 2, 5 and 7 and closing valves 1, 3, 4, 6, 8 and 9 andretracting the piston from EOD to HRP. Step 2 is repeated three times,which recirculates the fluid and helps accumulated air from the filterin the process fluid reservoir 30. The process fluid reservoir 30 expelsthe air out of the process fluid reservoir vent/drain in all threesteps.

The whole filter has been primed when all of the bubbles have beencollected at the top of the process fluid reservoir 30 and the filteroutput line is void of air. The pump will run a few more recirculationcycles that recharge from the source in order to push new liquid intothe process fluid reservoir 30 and vent the air bubbles. Step 3 repeatsstep 1 four times. This step is programmed to be repeated at least fourtimes to ensure process fluid comes out the filter output line withoutthe presence of air bubbles. If the filter has air bubbles present, theuser can input the command until no air is seen exiting the filteroutput line.

Startup Operations

A description of the startup process of the pump system 22 is asfollows:

Initial Pump Filling and Priming

The pump system 22 arrives on location containing only the pumping fluidhoused in the pump body 22A. The initial filling and priming processhelps to fill the flow path of user's desired processing fluid. Thisprocess requires a pre-existing fluid source with a pressurized BIB atthe inlet of the pump 22, a Fab reservoir FR with a Fab reservoirvent/drain valve 14, and an optional external dispense valve (externaldigital valve 9) to provide more customizable dispense control at theoutlet of the pump. Upon pump installation, the user connects the fluidlines to the pump system 20. This includes the line from the processfluid source FR to the pump inlet, the fluid outlet lines to the pointof external dispense valve, and the external track drain line from thepump system filter vent and process fluid reservoir drain. Thepressurized nitrogen (or dry air) line and the vacuum line need to beconnected to pump system 20 for valve controlling.

The initial filling and priming is followed by completion of pumpauto-balance. The initial filling and priming process begins with theuser starting the software process for this operation. There are twoscenarios in the customers' location:

Scenario 1: The first scenario is that the BIB is pressurized. A trackreservoir (i.e., Fab reservoir FR) may be in place between the initialsource and the pump system 20. If so, the pump controller 38 firstcloses the Fab reservoir vent/drain valve 14 and valve 1 located in theflow path between the initial source and the pump inlet; fluid is thenpushed into the Fab reservoir FR by the pressurized BIB. Once the sourceis pressurized, the pump controller 38 opens the following valves: thevalve 1 isolating the internal process fluid reservoir from the sourceinlet, the valve 2 isolating the process fluid reservoir 30 to theprocess fluid chamber 34B, the valve 3 isolating the process fluidchamber 34B from the external valve block flow path connected with thefilter fluid inlet, the valve 5 separating pumping fluid from the pistonchamber 28 and process fluid chamber 34A, and the external point of thedispense valve.

The following valves are closed to direct the fluid through the desiredpath: the Fab reservoir drain/vent valve V_(FAB), the valve 7 isolatingthe process fluid reservoir 30 from the drain line, the valve 6controlling the flow from the filter vent to the external drain line,and the valves 4, 6 and 10 controlling fluid flow from the filter outletback to the process fluid reservoir 30. The user controls the closing ofthe open valves to accommodate the varying time required to fill thepump system 20 and attached tubing. The varying time required tocomplete this process is a result of the varying internal total volumeof the tubing connecting the pump system 20 with the initial fluidsource FR and point of dispense as well as the varying flow rates. Theserates are functions of such fluid characteristics such as density,viscosity, and temperature. Other factors with limited effect would bethe density of the surrounding air and the flow rate of the externalpoint of the dispense valve. Once the process fluid travels to the pointof dispense, the majority of the volume in the pump system 20 has beenfilled with the process fluid.

Then, valves 3, 4, and 5 are opened to dispense into the process fluidreservoir 30 while all other valves stay closed. The maximum rechargefrom the source line is the following action by opening valves 1, 2 and5. This serial action ends when the automated pressure feedback in thepumping fluid reservoir 32 meets the pressure criteria in the processfluid reservoir 30. Then the filter change routine and recirculationoperation are required.

If the Fab reservoir FR is not in the track, the pump system housing canbe directly filled by the same procedures without filling the Fabreservoir FR first.

Scenario 2: The second scenario is that the BIB is not pressurized and aFab reservoir FR is in place between the initial source and the presentinvention pump system 20. The pump system 20 and Fab reservoir FR needto be filled by pump system 20 itself. It starts from a maximum dispenseto the point of the external digital valve by only opening valves 3 and5, and the external digital valve 9. Then it is followed by a maximumrecharge from the source line by only opening valves 1, 2 and 5. Thisserial action ends when the Fab reservoir FR is filled and process fluidcomes out of the dispense tip.

Afterwards, valves 3, 4 and 5 are opened to dispense into the processfluid reservoir 30 while all other valves stay closed. The recharge fromthe source line will be the following action by opening valves 1, 2 and5. This serial action ends when the automated pressure feedback in thepumping fluid reservoir 32 meets pressure criteria in the process fluidreservoir 30. Then the filter change routine and recirculation operationare required.

If the Fab reservoir FR is not in track, the pump system housing can bedirectly filled by the same procedures without filling the Fab reservoirFR first.

Maintenance Operations

A description of the maintenance operations of the pump system 20 is asfollows:

Fluid Recirculation and Purging

The pump system 20 incorporates a fluid recirculation function to reducethe process fluid waste during the process of purging any air from theinterior of the pump 22. This function allows the user to reduce thetotal cost of ownership for the pump system 20 through reducing thefluid consumption during purging as well as allowing the pump system 20to periodically internally recirculate the fluid. The ability toperiodically recirculate the process fluid reduces the possibility fluidcould become static in the tubing, preventing the fluid from congealingor drying and thus causing stoppages.

The internal fluid recirculation in the pump system 20 begins with thepiston 26 at the HRP. The pump controller 38 opens the valve 3controlling flow from the process fluid chamber 34B to the filter inlet,the valve 4 controlling the flow from the filter return outlet to theprocess fluid reservoir, and the valve 7 controlling flow from theprocess fluid reservoir to the drain line. This valve must be open toallow the recirculated fluid to fill the reservoir 30 and displace anyair or other gases out of the drain line. All other valves must remainclosed. The pump controller 38 performs a maximum volume dispense,closes the open valves, and opens the valve 2 controlling flow from theprocess fluid reservoir 30 to the process fluid chamber 34B and thevalve 7 controlling flow from the process fluid reservoir 30 to thedrain line. During the entire recirculation process the point ofdispense valve must remain closed.

During the recirculation process the internal fluid flow traps anyatmospheric bubbles in the process fluid reservoir 30 or the filter 42near the drain connections. The pump 22 displaces process fluid into theprocess fluid reservoir 30, and the collected bubbles of air or othergases along with a small amount of process fluid will be forced into thedrain line. This process will occur twice, once to purge the filter ventand again to purge the process fluid reservoir 30. During the filterpurging process, with the piston 26 at the HRP, the valve 3 controllingflow from the process fluid chamber 34B to the filter inlet, and thevalve 6 controlling flow from the filter to the drain line open whileall other valves remain closed. The two open valves will close, and thevalve 1 from the process fluid source FR to the process fluid reservoir30 and the valve 2 between this reservoir 20 and the process fluidchamber 34B will open to allow the piston 26 to recharge from source.During the process fluid reservoir purging process, the valve 2controlling flow from the process fluid chamber 34B to the process fluidreservoir 30 and the valve 7 controlling the flow from the process fluidreservoir 30 to the drain line will open. All other valves will remainclosed. The two open valves will close and the piston 26 will rechargefrom the source.

Electronics Enclosure 23 Removal

To assist with in track repairs, the pump 22 also allows for electronicsreplacement with ease. The electronics enclosure is completelyself-contained and can be easily removed by simply disconnecting thecables and pulling the box out.

To remove the electronics enclosure, the user needs to disconnect fiveexternal connections. Two RJ45 connectors, one serial connector, onepower connector and then, once these operations have been completed, theuser can then disconnect the DB44 connector to disconnect theelectronics enclosure 23 from the pump body 22A itself. The enclosure 23can now be slid upward and out to disconnect the box from the mount andcan be taken out of the cabinet. A new electronics enclosure 23 can nowbe installed by reversing the removal procedure.

Pump Head in Track Removal/Repair/Replacement

To remove the pump head 22A for in track maintenance purposes, the pumphead housings, including the process fluid chamber 34B and process fluidreservoir 30, need to be emptied by running the “System Drain” function.This operation allows the user to nearly empty the process fluid in theprocess fluid chamber and process fluid reservoir. Hence, the pump head22A can then be removed by unscrewing six screws on the back plate. Whenremoving the pump head 22B the user needs to be careful to keep the PTFEhead (white) and the back plate (stainless steel) pressed together andremoved as one unit. The screws are also to be kept together as one withthe pump head 22B. The pump head 22B with six screws can be slowly takenoff from the pump body 22A, and the pump head block 78 should be heldtightly while it is taken off with a backwards tilted angle; the userneeds to be prepared for a small amount of process fluid residuals inthe process fluid chamber 34B and process fluid reservoir 30 to leakout.

Users can change all the components on the pump head 22B (FIG. 6),including the pump head block 78, pump head O-ring 207, flare fitting47, flare fitting cap 350, set screws 111, head diaphragm 84, pump headpneumatic plate 80, pneumatic quick disconnect 95, screws 99, processfluid reservoir O-ring 281, valve O-rings 117, mounting foot 261, andelbow fitting 93. All the tubing connected to the process fluidreservoir 30 can also to be replaced/changed. The user can change oneitem or multiple items when the pump head 22B is taken off, or thecomplete pump head 22B can be replaced. An auto-balance cycle must berun after the pump head 22B is reinstalled since the pressure in thepump system 20 will be affected by the change.

Pumping Fluid Chamber Diaphragm Replacement

Users would replace the pumping fluid chamber diaphragm 36 when it isextremely deformed or out of shape. To perform this action, the pumphead 22B needs to be emptied using the “System Drain” function. The pumphead 22B needs to be removed as described in the “pump head in trackremoval/repair/replacement” section. Then the pump 22 needs to be put inthe special maintenance mode as described in the “in track driveassembly change” section that allows pumping fluid only to be able totransfer between the piston chamber and pumping fluid reservoir 32 toisolate the pumping fluid chamber 34A. The user needs to take off thebleed screw from the bleed screw port BP2 to the pumping fluid chamber32. Then using the provided syringe (FIG. 13) with thin tubing attached,draw the pumping fluid out of the pumping fluid chamber 34A until a verysmall amount of pumping fluid is left at the bottom of the pumping fluidchamber 34A to block the flow path. The user can save the pumping fluidin a container and reuse it after placing the new diaphragm. The pumpingfluid chamber diaphragm hold down plate 64 (FIG. 4) can be removed byunscrewing all the screws 66. When removing the hold down plate 64 anddiaphragm 36, the user needs to tilt the pump body 22A in order to keepresidual pumping fluid at the bottom of pumping fluid chamber 34A andreduce leaking. The user needs to be aware of the residual pumping fluidaround the diaphragm and be prepared for a small amount of leaking.

This allows the user to change/replace the following parts (see FIG. 4):bleed screw 52E on the pumping fluid chamber 34A, pumping fluid chamberO-ring 211, pumping fluid chamber diaphragm 36, pumping fluid chamberdiaphragm hold down plate 64, and screws 66. After the new pre-stretcheddiaphragm with hold down plate and screws are reinstalled, the userneeds to fill up the process fluid chamber 34B with the provided syringe(FIG. 13) and reuse the pumping fluid from the pumping fluid chamber34A. Slowly inject pumping fluid to the pumping fluid chamber 34Athrough bleed port BP2 (FIG. 4) until the pumping fluid appears tooverflow from bleed port BP2. The bleed screw 52E needs to be installedback on the process fluid chamber 34B. After the pump head back isreinstalled onto the pump body 22A, the special maintenance functionneeds to be disabled as described in “in track drive assembly change”with closing valve 8 and opening valve 5. That allows the pump system 20back to regular maintenance mode. The pump system 20 is required to runan auto-balance after a pumping fluid chamber diaphragm 36 replacementand after a process fluid chamber diaphragm 84 replacement.

Pressure Sensor Calibration:

The purpose of pressure sensor PS calibration is to set a default “zero”pressure when the pump internal pressure is equalized to atmosphericpressure. The pressure sensor PS needs to be calibrated when pumpingfluid reservoir bleed port BP1 is uncapped and all valves in fluid pathare open. Place the unit in maintenance mode. All valves can be openedby typing “VON1, 0” in command input line in the GUI. Then the pressuresensor default can be set through the GUI recipe page. Thus, the usercan set default “zero” pressure through “set pressure to zero” featurein the GUI. This operation is essential since many operating locationswill have different atmospheric pressures than the manufacturinglocation and this allows for the pump 20 to be calibrated for thatparticular locations ambient atmospheric pressure.

Recirculation:

The Recirculation feature (see FIGS. 16A-16B) of this pump 20 is afeature that helps reduce the air in the tubes that forms from variousplaces (such as in the filter) and allows for a small circulation systemto permit fluid movement while the dispense portion of the pump is idle.This feature may be turned on or off as designated by the user. TheRecirculation feature is activated or deactivated while the pump is in“Maintenance Mode” and is completed by selecting the “enable” or“disable” command from the “Maintenance” window, Recirculation tab ofthe GUI or by the RMVC subsystem. When the recirculation feature isdeactivated, the valve 4 for the recirculation line is closed (on theFilter Block 40) and process fluid moving out of the process fluidchamber 34B and into the filter 42 simply continues on its path in thedispense tube. If the Recirculation feature is activated however, thepump 20 opens valve 4 during a dispense and keeps the external valveclosed. This operation opens valves 3, 4, 5, and 7 to allow fordispensed process fluid to move into the process fluid reservoir 30.With valve 4 open, there is a back pressure due to the incompressibilityof the fluid which does not allow the fluid to continue in the dispensetip path and the fluid is then forced into the recirculation line. Thefluid dispensed during recirculation is “dispensed” into the processfluid reservoir and displaces the air pocket that is kept in the processfluid reservoir. Valve 7 is opened as well to allow for the displacementof air as the process fluid is forced into the process fluid reservoir30. The pump 22 “recharges” from the process fluid reservoir 30 byopening valves 2, 5, and 7 filling the process fluid chamber 34B withthe same volume of liquid that was pushed into the process fluidreservoir.

Drain Function:

The system 20 has a drain feature (FIGS. 24A and 24B) that is used inthe draining of the pump of process fluid to allow for certainmaintenance functions to occur. Once a SYSTEM DRAIN has been performed,the filter must be discarded. This operation removes most of the fluidthat is stored in the process fluid reservoir 30, the process fluidchamber 34B and the recirculation line, but there will be some residualfluid in the pump 22. The filter 42 will still hold some of its volumeamount of fluid. The System Drain function is activated or deactivatedwhile the pump is in “Maintenance Mode” and is completed by entering thecommand SDRN1 to enable or SDRN1 to disable. Before the SYSTEM DRAIN canbe completed, the user must disconnect and cap off the source line fromthe pump to allow for the introduction of air into the pump system. Thisfunction begins the pump is a user-operated loop that drains the pump ofprocess fluid. This operation begins with a purge to output operation tothe full 11 mL by opening valves 3 and 5, external dispense valve suchas the LP Digital Valve 9. Once the pump 22 has completed this dispenseit closes valves 3 and 5 and the external valve. The pump then“recharges” from the process fluid reservoir 30 by opening valves 1, 2and 5 and pulling in 11 mL of air. The pump continues with the systemdrain operation by closing valves 1, 2 and 5 and opening valves 3, 4, 5and 7 to push fluid out of the recirculation line into the process fluidreservoir. The pump then closes valves 3, 4, 5 and 7 and opens valves 2,5 and 7 and pushes fluid out of the process fluid reservoir drain lineand then closes valves 2, 5 and 7. This series of operations is repeateduntil the user disables the System Drain function. This function removesprocess fluid from the pump 22 allowing for the removal of the pump head22B.

System Drain Operation

1. Remove and cap FAB source line

2. Purge to output

-   -   a. Opens 3,5,DV    -   b. Valves 1,2,4,6,7,8 closed (DV at any state)    -   c. Recharge from source        -   i. Opens 1,2,5        -   ii. Valves 3,4,6,7,8 closed (DV at any state)

3. Recirculation

-   -   a. Opens 3,4,5,7    -   b. Valves 1,2,6,8, DV closed    -   c. Recharge from process fluid reservoir        -   i. Opens 2,5,7        -   ii. Valves 1,3,4,6,8 closed (DV at any state)

4. Purge to vent

-   -   a. Opens 2,5,7    -   b. Valves 1,3,4,6,8 closed (DV at any state)    -   c. Recharge source        -   i. Opens 1,2,5        -   ii. Valves 3,4,6,7,8 closed (DV at any state)

5. Repeat steps 2-4 (until the user sees that no fluid comes out of thedispense tip or the process fluid reservoir drain line)

Ship Function

This ship function is a feature programmed into the pump 20 which isused to remove all air from all of the pumping fluid chambers andreservoirs. This function is to be used during assembly and operates bypushing all of the pumping fluid from the piston chamber 28 to thepumping fluid reservoir 32. This operation is completed by the userremoving the bleed screw BP1 on the pumping fluid reservoir 32 andinputting the command “SHIP1.” This command opens valve 8 and advancesthe piston downward to the 11 mL end of dispense (EOD) mark. This movesthe piston 26 to the bottom of the piston chamber 28 while pushing thepumping fluid to the pumping fluid reservoir 32 and pushing the air inthe pumping fluid reservoir 32 out of the pump. The user will see alittle bit of pumping fluid emerge from the pumping fluid reservoir 32.The user then caps the bleed port BP1 on the pumping fluid reservoirwith the bleed screw and the pump body now is void of air and is readyfor shipping.

Out of Box Operation (FIGS. 25A and 25B):

The pump 22 arrives on location to the user with the pump bodycompletely filled with pumping fluid and void of any air. The user theninstalls the pump 22 into the track system and remove the pumping fluidreservoir bleed port screw. The pump inlet needs to be connected withusers' fab reservoir outlet or the in track reservoir outlet if it isprovided. The pump outlet needs to be connected to the lab dispenseoutlet and an external digital valve 9 if it is provided. The externaldrain line needs to be connected from filter drain line to an outlet inthe fab. Once power is supplied to the pump, the pump begins its autobalance procedure and since the piston 26 was at its 11 mL EOD positionthe pump will return to HRP by opening valve 8 and retracting. Thisprocess pulls 11 mL of air into the pumping fluid reservoir 32 and thencontinues with its auto balance processes. Once the pump 22 hascompleted the auto balance, (bearing in mind that this is where the usermay need to perform a pressure sensor calibration since atm pressure isdifferent at different altitudes) the user can now cap the pumping fluidreservoir bleed port BP1. At this point, the pump 22 is ready tocomplete the priming procedures and is close to being operational.

Customizable Pressure Alarms

The pump system 20 also allows users to customize the overpressuresetting for the pressure alarm according to operation pressure at theusers' location. Users can also set the duration for the over pressurealarm. Users can input the command “OVRPd,x” into the command line inthe IDI or LYNX GUI for this purpose. “d” is the overpressure durationin ms. Users can set the value between 0 and 999 ms. “x” is the pressurelimit to trigger the pressure alarm. There are two pressure values userscan use; one is 28 psi, which can be represented by “1”; the other is 50psi, which can be represented by “0”. For example, “OVRP125,1” setsoverpressure duration to 125 ms @ 28 psi.”

Changing the Motor/Piston Assembly (Drive Assembly Change)—FIG. 26

The pump system 20 includes the ability to remove and replace themechanical drive assembly 24 with inside without breaking the flow path.As mentioned previously, this drive assembly 24 (FIGS. 8-9) comprisesthe electrical DC motor 24E, lead screw 24G, piston 26,Polytetrafluoroethylene (PTFE) wiper ring 191 and accompanying hardware.The accompanying hardware includes the guide bearing 24F, anti-rotationflag 56, bolts 24A-24D for holding down the motor 24E and piston O-rings74.

The drive assembly 24 replacement is designed to take place with minimaldisturbance to the pump system 20. Drive assembly replacement requiresthe removal of the enclosure, the four motor mount bolts, motor powerplug, and the pumping fluid reservoir bleed port BP1 screw.

The drive assembly replacement process allows the drive assembly to beremoved, repaired, and replaced without disturbing the process fluidflow path. This eliminates the risk of exposing the process fluidchemicals to air and other contaminants, and reduces the amount ofprocess fluid and amount of requalification time needed to release thetool back into production.

The drive assembly replacement process (FIG. 2) begins when the userenters the drive assembly change procedure in the connected software ofmicrocontroller 38. There are two ways that drive assembly replacementcan be accomplished depending on the pump operation program interface:using the GUI or by using the RMVC subsystem operational interface

(1) Using the GUI (FIG. 13A, 13H or 13L)

-   -   a. The pump 22 needs to be put in maintenance mode, which allows        valve 5 to separate pumping fluid from the piston chamber 26 and        process fluid chamber 34B to be open. By typing the “SPCF1”        command in the command input line, this allows the pump 22 to        enter into a special maintenance mode while closing valve V5,        separating pumping fluid from the piston chamber 28 and pumping        fluid chamber 34A. At this stage the user needs to activate the        push button switch 25A (FIG. 3), which is attached onto the PCB        pressure board 48, to the “ON” position to open valve 8. That        allows an open flow path for pumping fluid between the piston        chamber 28 and pumping fluid reservoir 32.    -   b. Next, the pumping fluid reservoir bleed port screw for port        BP1 needs to be removed. User needs to install the provided        syringe (FIG. 13) by screwing the male end to the pumping fluid        reservoir bleed port BP1. The syringe plunger is drawn at end of        the syringe. This allows air exchange between the pumping fluid        reservoir 32 and the syringe chamber during the drive assembly        replace process. The connection of the syringe also enables the        pump 22 to move pumping fluid in the piston chamber 28 to the        shoulder position 200 (FIG. 10). By removing four bolts 24A-24D        holding down the motor 24E and unplugging the motor power from        PCB pressure board 48, the drive assembly 24 can be gradually        pulled out of piston chamber 26.    -   c. Next, the user needs to slowly push air through the syringe        to the pumping fluid reservoir 32 to raise the pumping fluid        level in the piston chamber 26 approximately to the shoulder        200. The new or repaired drive assembly with the piston located        at the home position can be slowly inserted into the piston        chamber 26. The assembly should be oriented with the conical        portion 76 of the piston 26 facing downward into the piston bore        28. The motor 24E should be oriented so that the wires that        connect the motor to the pressure PCB 48 are located just above        the pressure PCB 48. The piston 26 should be oriented so that        the anti-rotation flag 56 easily fits into the clearance channel        and the conical section of the piston is centered in relation to        the piston bore when the drive assembly is held vertically        (electrical drive motor 24E on top and piston 26 facing straight        downward). The drive assembly 24 should be lowered until the        conical section of the piston 26 is inside the piston bore 28        and the drive assembly 24 is resting on the lower (furthest from        the electrical drive motor) O-ring 74. The conical shape 76 of        the piston 26 causes the pumping fluid and air to be displaced        and the fluid level rises to completely fill the volume below        the lower O-ring 74.    -   d. Next, the four bolts 24A-24D need to be reinstalled to hold        down the motor 24E, and the motor power needs to be plugged back        on the PCB pressure board 48. The syringe (FIG. 13) can be        removed by unscrewing it from the pumping fluid reservoir bleed        port BP1.    -   e. Finally, the user can flip the switch that is attached to the        PCB pressure board 48 back to the “OFF” position. This permits        valve 8, separating the piston chamber 28 and pumping fluid        reservoir 32, to be closed. By typing “SPCF0” in the command        input line, that disables the special maintenance mode and puts        the pump 22 into regular maintenance mode by opening valve 5.        The auto-balance proceeds then needs to be conducted in order to        ensure that the piston 26 is back to its reference home position        HRP. Upon completion of the auto-balance, the user needs to        reinstall the pumping fluid reservoir bleed screw back onto the        pumping fluid reservoir bleed port BP1.

(2) Using the Remote Monitoring, Viewing & Controlling (RMVC) Subsystem

-   -   a. By using the RMVC subsystem operational interface (FIGS.        13D-13G), maintenance can be enabled by clicking on the        “Enter/Exit Maintenance” button on the maintenance page. Under        “Advanced” tab, it includes the drive assembly function. By        clicking on “Change Drive Mechanism” tab, the drive assembly        replacement procedures are shown on each following tabs. By        clicking on “Enable Drive Change” tab, this closes valve 5,        separating the pumping fluid in the piston chamber 28 and        process fluid chamber 34A to separate pumping fluid in the        piston chamber 28 and pumping fluid chamber 34A while opening        valve 8, separating the piston chamber 28 and pumping fluid        reservoir 32.    -   b. At this point, the steps of 1(b)-1 (d) above for the “Using        the GUI” are implemented.    -   c. For the last step, the user can click on the “Disable Motor        Change” tab. This closes valve 8 and opens valve 5. The user        then clicks on the “Autobalance” tab to assist the piston 26        back to the home reference position HRP. Upon completion of the        auto-balance procedure, the user needs to reinstall the pumping        reservoir bleed screw back onto the pumping reservoir bleed port        BP1.

Test of Gas Pressure in Piston Chamber After Drive Assembly Change inTrack

This operation helps the user to determine if any air was introducedinto piston chamber during the drive assembly change process. Before thedrive assembly change, it is recommended to run the Gas in PistonChamber Detection procedure (FIG. 28). This process can be run at anytime before the drive assembly change, for example, before or after theSystem Drain procedure has been run. This procedure goes through aseries of steps which monitor the increase in pressure over the lineardistance the piston travels. If the system experiences a pressure alarmwithin 0.1 mL of linear distance traveled or has a change in pressureover change in distance, DP/DX, of over, by way of example only, 5, thenthe piston chamber 28 is void of air. This assists the user indetermining whether or not air was in the system prior to the driveassembly change and after the pump has been reassembled, the user againruns the Gas in Piston Chamber Detection procedure. The procedureindicates if air is in the piston chamber 28 after the drive assemblychange. This gas detection sequence simply indicates to the user that ifthe system was void of air prior to the drive assembly change and if airis detected in the system after the drive assembly change, then the airwas introduced during the drive assembly change itself. If the Gas inPiston Chamber Detection procedure detects air in the system after amotor assembly change, the user must re-run the drive assembly steps toensure that there is no air in the piston chamber 28.

Filter Cartridge Change:

A filter 42 is replaced by the user simply lifting up the release leverof the filter bracket and sliding out the old filter. The user slides ina new filter 42 and pushes down on the release lever which fixes andseals the filter 42 in place. The user then runs the PPRM2 and PPRM3operations to fill and prime the filter housing and substrate and purgethe filter of air.

Auto-Balance

The pump system 20 incorporates an auto-balancing (see flow chart inFIG. 17) to equalize the pressure in the pump head(s) as well as tocorrect any inconsistency in the amount of fluid contained in theprocess fluid chamber(s) when the pump is in an “at-rest” position. Thisfunction allows the user to perform many maintenance functions withoutrequiring the removal of the pump from the enclosure or the removal ofthe lower enclosure from its mounted position. This function also allowsthe pump to maintain a repeatable volume of fluid into the process fluidchambers, allowing for better control of the dispense characteristics ofthe pump and to prevent the possibility of damaging operations fromoccurring. The auto-balancing process every time power is applied to thepump or with the user starting the software process for this operation.The Auto-Balance begins its operation by checking if the piston is inthe HRP. If the piston is not at HRP, the pump then opens valve 8 andpulls the piston 26 back to HRP while pulling pumping fluid out of thepumping fluid reservoir 32. Once the piston is at HRP or if the piston26 was originally at HRP, then the auto balancing procedure continues.The pump 20 then begins the next step by opening valve 8 and moving thepiston 26 forward to push 4 mL of pumping fluid into the pumping fluidreservoir 32. The pump 20 then closes valve 8 and opens valve 5 (the twoisolation valves) and begins to retract the piston 26 to HRP whilemonitoring the pressure on the pressure sensor PS. The pump 20 stops ifa pressure reading of negative 4.0 psi is detected or when reaching theHRP. If the pump 20 reaches a pressure of negative 4 psi, then the pump20 continues with the auto balance, but if the pump reaches the HRPwithout reaching the desired pressure, then the pump 20 repeats theprocess of pushing fluid into the pumping fluid reservoir 32 via valve 8and then closing valve 8 and opening valve 5 and recharging from thepumping fluid chamber 34A until the desired negative pressure isreached. Once the desired pressure is reached, it closes valve 5 andopens valve 8 and returns the piston 28 to HRP pulling pumping fluidfrom the pumping fluid reservoir 32 and then closes valve 8. The pumpthen opens valve 5 and moves the piston 26 forward to push 1.5 mL intothe process fluid chamber 34B and stops. The pump 20 then closes valve 5and opens valve 8 and returns to HRP. At this time, the pump 20 isfinished with the “Auto Balance” and has done all of the proceduresneeded to keep a consistent amount of pumping fluid into the pumpingfluid chamber 34A.

In particular, the head auto-balancing process begins with the userstarting the software process of the microcontroller 38 for thisoperation. The pump controller 38 prompts the user to remove the pumpingfluid reservoir bleed port screw from the universal elbow fittinglocated on the upper front face of the pump 22 (side of the pump bodylocated farthest from the enclosure mounting bracket) at the port BP1.The pump controller 38 then opens the isolation valve 8 separating thepiston chamber 28 from the pumping fluid reservoir 32. The pumpcontroller 38, via the motor drive assembly 24, then drives the piston26 to the end of the dispense position (the farthest position from theat-rest home position, equal to the position stopped at during an 11 mldispense) effectively emptying the piston chamber 28 of fluid. The pumpcontroller 38 then closes the isolation valve 8 separating the pumpingfluid reservoir 32 and the piston chamber 26 and opens the isolationvalve 5 separating the piston chamber 26 and the process fluid chamber34A.

At this point, the pump controller 38 drives the piston 26 to enter aslow recharge movement towards the home position while the pumpcontroller 38 continually monitors the pressure. Once the pressuretransducer PS detects that the pressure in the chamber 28 is atatmospheric pressure (0 psig) the pump controller 38 continues torecharge, but at a reduced velocity. The piston 26 continues to returnto the home position at the reduced rate until the pressure transducerPS detects a sufficiently negative pressure (negative pressure refers tothe pressure differential between the internal pump body pressure andlocal atmospheric pressure; this is not a user variable). Once theinternal pump body pressure reaches this level, the piston 26 begins todispense at the same reduced velocity it recharged by. The pressuretransducer PS again continually monitors the internal pump body pressureas the piston 26 dispenses. Once the pressure transducer PS indicatesthe internal pump body pressure equals atmospheric pressure, the piston26 then stops.

The isolation valve 8 separating the piston chamber 28 and the pumpingfluid chamber 32 closes and the isolation valve 8 separating the pistonchamber and the pumping fluid reservoir 32 opens. The piston 26 thenreturns to the home position, pulling fluid from the pumping fluidreservoir 32. Once the piston 26 has returned to the home position, allvalves close and the pump controller 38 prompts the user to replace thepumping fluid reservoir bleed port screw at the port BP1 to seal thepumping fluid reservoir 32.

Dispense Detection

The dispense detection feature is intended to detect many of the commoncauses of wafer coating problems, including:

-   -   Air in dispense line    -   Dispense/Suckback valve malfunction    -   Clogged nozzle    -   Kinked tubing    -   Dispense line Leaks

Dispense detection works by comparing the pressure profile for eachdispense to a reference pressure profile. If the two profiles do notmatch within a user selectable sensitivity, the pump generates an alarm.

Whenever any change is made to a recipe, a new reference profile will besaved. The event log records each time a new reference profile is saved.

Operation:

The user begins running dispenses; the dispense detection is set andruns to record the Golden Sample after any change to a recipe. Once aGolden Sample is stored, any dispense that deviates by more than a userprogrammed percentage and number of counts out of the limits will stopthe pump 20 and trigger an alarm.

Dispense Detection may be used with pressure sensor PS (or, e.g., Isensethat models pump pressure based on motor current) providing the pressureprofile data.

Pressure Sensor:

Pump chamber pressure is measured directly.

Isense Functionality:

Pump chamber pressure is inferred as described below.

Isense H/W:

Current is sensed via the voltage drop across the stepper motor driversense resistors (FIG. 14). Each phase is half-wave rectified with anactive rectifier. The rectified signals are then summed and integrated.Stepper noise is removed with an envelope detector. The resulting signalis dc amplified and voltage translated such that the voltage window ofinterest is translated to the maximum limits of the A/D converter. Thisallows utilization of the maximum resolution of the A/D.

Isense F/W:

Initial calibration is done by running the motor at each operating rate& storing the unloaded “baseline” A/D value.

Motor load is obtained by subtracting the baseline from the presentsample. This yields a value proportional to the motor load. This valueis gain corrected for any non-linear & rate related artifacts.

Alternate Dispense Detection Quality Reporting:

A dispense alarm occurs when any dispense deviates, from the referencedispense, by more than a user programmed percentage and number of countsout of the limits.

After each dispense, a “Dispense Quality” number is displayed. Thisnumber is shown as a percentage. If 100% of the dispense counts arewithin limits, “Dispense Quality”=100% is displayed. If 50% of thedispense counts are within limits, “Dispense Quality”=50% is displayed.The dispense may be divided into segments and each segment's “DispenseQuality” may be reported separately.

Alternative Embodiment Supporting Filter Recirculation and NitrogenSupply to Process Fluid Reservoir

FIGS. 15 and 15A depict an alternative embodiment of the precision pumpsystem 20 that includes additional DIV valves (10-13) and venturi thatpermit the recovery of process fluid entrained within the filter 42during a filter recirculation process. Typically, to remove the trappedgas in the filter 42 to the filter drain, process fluid entrained withinthe filter 42 is also discarded too. However, with the inclusion ofvalves 10 and 11, it is possible to remove the trapped gas from thefilter but to recirculate the trapped process fluid from the filter 42back to the process fluid reservoir 30.

In addition, should microcontroller 38 detect that all gas has beenremoved from the process fluid reservoir 30, in order to re-establish agas head within the process fluid reservoir 30, a nitrogen N₂ source iscoupled to the top of the process fluid reservoir 30 via a DIV valve 12.The pump controller 38 can permit a predetermined amount of nitrogen toform a gas head within the process fluid reservoir 30. This N₂ ispre-filtered before being delivered to the valve 12 and then to theprocess fluid reservoir 30 at a regulated 20 psi.

Gas Detection Algorithm and Gas Volume Detection Algorithm

The gas detection algorithm is required to automatically prime thefilter 42, and the gas volume detection algorithm is important foroperation with the pre-reservoir 30. See FIGS. 27A-27B for Gas in FilterDetection Algorithm; FIGS. 28A-28B for Gas in Piston Chamber DetectionAlgorithm; and FIGS. 29A-29B for Gas Volume in Process Fluid ReservoirDetection Algorithm.

The sequences below refer to the distance rate of change of pressure(dp/dx) but they could also be made to work equally well using the timerate of change of pressure (dp/dt) as long as it is correlated back tothe distance traveled based on the speed of travel of the piston26—since that ultimately correlates back to a volume change—and all ofthis is based on the ideal gas law correlating volumes and pressures ofa gas that experiences a volume change without experiencing anysignificant change in temperature.

The key principal in both of these algorithms is that the piston 26 isadvanced in a closed system and the rate of change of pressure ismeasured. Very high rates of change of the pressure (a pressure spike inthe extreme case) indicate there is no gas, whereas low rates of changeof the pressure indicate the presence of gas. The actual measured rateof change of pressure can be correlated back to empirically determinedvalues (of rates of change of pressures) to determine an estimate of theamount or volume of gas in the system.

Gas detection algorithm (typically used to determine the presence of gasin the filter system, but can also be used to test for the presence ofgas after the motor change feature)1. Record the pre-charge pressure setting in a global variable2. Set the pre-charge pressure to zero and wait for the pump chamberpressure to equalize to zero. This step isn't required but yields moreconsistent results, better results in general.3. Close and open whatever valves are necessary to seal off the portionof the pump that needs to be tested for the presence of gas.4. Measure the pressure and record it in a global variable5. Advance the piston some distance (nominally 0.5 mL equivalentdisplacement); while the piston 26 is advancing execute these steps:

-   -   a. measure the instantaneous pressure and record it in a global        variable    -   b. calculate the distance rate of change of pressure (dp/dx)        based on the current pressure reading and the initial pressure        reading and the position of the piston 26    -   c. if the rate of change of pressure (dp/dx) exceeds a threshold        value (dp/dx>5 typically indicates no presence of gas in the        system) previously empirically determined to indicate no        presence of gas in the system—then the system is determined to        not have any gas present.        6. Alternatively a pressure alarm within a 10th of a milliliter        of equivalent distance traveled would also indicate there is no        gas trapped in the system. The optimal value can be empirically        determined based on the physical makeup of the system.        7. if the piston advanced through the full test distance        (nominally 0.5 mL of equivalent displacement) without having a        pressure alarm or exceeding the threshold distance rate of        change of piston chamber pressure—then that section of the pump        is determined to have gas trapped in it.        8. Close and open whatever valves are necessary to bring the        pump back to its ready state        9. set the pre-charge pressure to whatever it was before from        the global variable that was used        10. the pump will take some amount of time to equalize back to        the appropriate precharge pressure        Gas volume detection algorithm (typically used to determine the        volume of gas in the pre-reservoir 30)        1. Record the pre-charge pressure setting in a global variable        2. Set the pre-charge pressure to zero and wait for the pump        chamber pressure to equalize to zero.        3. Close and open whatever valves are necessary to seal off the        portion of the pump that needs to be tested to determine the        volume of gas.        4. Measure the pressure and record it in a global variable.        5. Advance the piston some distance (nominally 1 mL equivalent        displacement); while the piston 26 is advancing execute these        steps:    -   a. measure the instantaneous pressure and record it in a global        variable    -   b. calculate the distance rate of change of pressure based on        the current pressure reading and the initial pressure reading        and the position of the piston    -   c. if the rate of change of pressure exceeds a threshold value        previously empirically determined to indicate no presence of gas        in the system—then the system is determined to not have any gas        present.        6. Alternatively a pressure alarm within a 10th of a milliliter        of equivalent distance traveled would also indicate there is no        gas trapped in the system. The optimal value can be empirically        determined based on the physical makeup of the system.        7. If the piston advanced through the full test distance        (nominally 1 mL of equivalent displacement) without having a        pressure alarm or exceeding the threshold distance rate of        change of piston chamber pressure—then that section of the pump        is determined to have gas trapped in it. If the system is        determined to have gas trapped in it then execute these steps:    -   a. calculate the distance rate of change of pressure (dp/dx)        over the piston displacement (nominally 1 mL of equivalent        displacement)    -   b. volume=dp/dx*15 (approximately, and more data will be taken        to get the best empirical correlation)    -   c. if the one milliliter displacement test determines that there        is 20 mL or greater of gas in the system then another test can        be run with a larger displacement to get a more accurate        determination of the exact volume of gas trapped in the system.        8. Close and open whatever valves are necessary to bring the        pump back to its ready state        9. set the pre-charge pressure to whatever it was before from        the global variable that was used        10. the pump will take some amount of time to equalize back to        the appropriate precharge pressure.

It should be understood that the numerical terms in the above algorithmsand in the accompanying FIGS. 27A-29B are approximate values that may besubject to change as the pump system is further developed.

It should also be noted that for the process fluid reservoir 30, thereare optional apparatus including:

-   -   pre-reservoir having an inlet for a nitrogen blanket (low        pressure supply of nitrogen that is process filtered); see also        FIG. 15A.    -   there is a valve on the nitrogen blanket supply to turn it off        or turn it on;    -   there is a check valve on the pre-reservoir drain line biased to        only allow flow out of the process fluid reservoir. This check        valve can be located upstream or downstream of a typically        located drain valve;    -   there is a venturi supply vacuum to pull fluid out of the drain        line, or it may be needed to overcome any pressure differential        that would tend to push fluid back from the drain line into the        process fluid reservoir. The venturi has a nitrogen supply that        also has a valve to turn off or turn on the nitrogen supply so        that the venturi is not running all of the time.

FIG. 30 provides an overview of the major features of the presentinvention 20, which are also discussed below. Moreover, one of keyfeatures of the present invention is a reservoir associated with thepump wherein the valves and any associated fluid control components forthe reservoir are controlled by a microcontroller or other device thatis in communication with or whose activities are coordinated with anycontrolling system associated with the pump.

Flow path continuity: This pump has a distinct advantage to others inthe field when it comes to maintenance downtime. The use of a diaphragmpump with a pumping fluid and the ability to access a reservoir of thispumping fluid allows the pump 20 to move the fluid between chambers, ifneeded for repairs. On pump with multiple outputs, the user can changethe filter, process fluid chamber diaphragm, or isolation valve on oneoutput without affecting the others.

In track repair: The drive system can be easily replaced without theuser needing to take the pump out of the coater/developer. This is madepossible by the use of the pumping fluid reservoir and the conicalpiston head shape. The electronics enclosure is another item that caneasily be replaced in the coater/developer. The wiring harness simplyunplugs from the pump enclosure allowing it to remain in thecoater/developer undisturbed while the electronics enclosure isreplaced. It is also possible to change a pump head in thecoater/developer as it can be drained of all process fluid and removed.Once the new head is attached to the pump body the system can be autobalanced and returned to production without breaking the flow path.

Predictive maintenance: The pump system 20 has the ability to detect andalert the user to a wearing system part. Different wear parts will causedifferent recognizable patterns in the dispense profile. The system willrecognize these and alert the user of the need to replace the identifiedtroublesome part. These parts include the drive system, the integrateddiaphragmatic valves, and the filter.

Possible Detectable Faults:

Leaky piston O-rings

Air in Pumping Fluid

Air in Process fluid

Compressibility during pre-charge

Leaky diaphragmatic valves charge leak down

Filter excessive back pressure

Pump Chamber pressure exceeds limit

Lead screw back lash

Torque changes on motor reversal

Binding Lead screw/Motor

Increasing torque requirements

Digital valve binding

RMVC webcam

Dispense Detection: errors, graphs. The pump system has the ability todetect a good dispense by studying the profiles of the dispenses made.It alerts the user if a dispense is outside of the tolerance set by theuser. The system also displays a graphical view of the data collectedand how it compares to the baseline data set during the first dispenseunder the current dispense configuration.

Zero Loss Pump: The present invention is directed to achieving zero lossof process fluid by recirculating unused or undispensed process fluid tothe pre-reservoir 30.

Pre-filtration by pulling a vacuum through the filter 42: Thepre-reservoir 30 removes any gases (viz., air) that passes through thefilter.

Process Fluid Reservoir Inlet Configuration: The process fluid sourceinlet is positioned on the roof of the process fluid reservoir where theside wall meets the roof on the shorter vertical side. The purpose ofthe source inlet's position is to allow for the process fluid to enterinto the process fluid reservoir at an angle near the side edge whichallows for the process fluid to smoothly run down the wall of theprocess fluid reservoir instead of dripping from the top of thereservoir, which can cause the capturing of air as the fluid falls.

Liquid Level Sensor (LLR)

When pre-filtering on a single stage pump, any gas that is generated(i.e., if the vapor pressure barrier is exceeded) is sent directly outthe dispense tip. By pulling fluid through the filter and into the topof the process fluid reservoir (or near the bottom by using a slopeddesign), and then having the fluid flow out the bottom of the reservoir,any gas that was generated by the filter will be removed before exitingthe reservoir. In order for the process fluid reservoir to work in aclosed system, a gas/liquid interface inside the process fluid reservoirmust be maintained. Some semiconductor manufacturing facilities do notallow for outside air to come in contact with the chemical to preventcontamination or particles from entering the process flow, so processgrade N2 is used when needed. The amount of N2 and/or fluid can bemanaged within the reservoir with a program that measures the pressureexerted by the pump when pushing back to the process fluid reservoir, orby using a fluid level sensor (LLS), optical sensor, float sensor, flowmeter, pressure sensor/meter, weight measurement device, visual, camerasystem, or any other means of determining the amount of fluid in theprocess fluid reservoir.

Pre-Reservoir Near The Pump (PRNTP)

During the startup phase and/or filter change, the filter and plumbing(tubing) needs to be wetted with fluid. One of the concerns was over theloss of liquids during this process. To minimize the effect, the systemwas designed around a (PRNTP) that will recirculate the liquid andremove any air that was in the system to start with or being generatedby recirculation of normal filter venting. By filling from the top andpulling liquid out of the bottom of the (PRNTP), an air/liquidseparation barrier is achieved (this could also be done by filling fromthe bottom and pulling liquid out of the bottom). If needed, a smallvacuum (negative pressure) could be applied to further aid or speed upthe air/liquid separation. The key to reducing liquid waste in thedispensing system is the ability to keep a prescribed amount of air/N2in the (PRNTP) to allow for fluid to reenter the closed system, which isaccomplished by allowing air/N2 to enter the (PRNTP) and/or making surethat there is sufficient air/N2 in the (PRNTP). The (PRNTP) also allowsfor any fluid released during normal venting of the filter to be sentback to it, thus keeping with a near zero loss of liquid objective.Air/N2 can be added to the system by adding a pressurized line, apressurized regulated line, open air, vent or drain line. Some of theways that the amount of air/N2 and/or liquid can be managed are with aprogram that measures the pressure exerted by the pump when pushing backto the (PRNTP), using a liquid level sensor (LLS), optical sensor,weight measurement device, float sensor, flow meter, pressuresensor/meter, visual, camera system, or any other means of determiningthe amount of fluid in the (PRNTP).

To do this, 1) all of the valves are closed. 2) Then valves 1 and 2 areopened. The pump head moves in a direction that will generate a vacuumdrawing fluid into the (PRNTP), then into the pump head. Pump movementis repeated until the pump head is full. 3) Valves 1 and 2 are thenclosed. 4) Valves 3 and 4 are opened and the pump head moves in adirection that will generate a positive pressure pushing fluid into andthrough the filter. Steps 1) through 4) are repeated until the filter iscompletely wetted. To remove any air trapped inside the filter, steps 1)through 3) are performed. Step 5) opens valves 3 and 10 are opened andthe pump head moves in a direction that will generate a positivepressure pushing air out of the filter (to the filter drain). Step 6)runs a program to determine if there is any air left in the filter, andthen all valves are closed. Steps 1) through 3) and steps 5) through 6)are repeated until all air has been removed from the filter. To fill the(PRNTP) to the prescribed level, Steps 1) through 3) and steps 5)through 6) are repeated until completed. The last phase is to remove theair from the dispense tip. Step 7) closes all valves and then valves 1and 2 are opened. The pump head moves in a direction that will generatea vacuum drawing fluid into the pump head. All valves are closed andthen valves 3, 11 and 9 are opened. The pump head moves in a directionthat will generate a positive pressure pushing fluid out the dispensetip. Repeat step 7) until all air is removed from the dispense line.This procedure allows for minimal if any loss of liquid during thestartup phase, filter change, and/or normal dispense (where air isremoved/vented from the filter on a predefined, automated, or manualschedule).

Ability to Use Pre/Post Filtration with One Pump-Moving Connections tothe Filter

By incorporating the use of an (PRNTP), post filtration can be obtainedas shown in the Pre-Reservoir Near The Pump (PRNTP) description wherethe filter is between the pump and the dispense tip.

By moving the connections to the filter where the filter is locatedbefore the (PRNTP), or any reservoir, gas generated from pulling avacuum to create flow through the filter can be removed to provide for abubble free dispense. Monitoring filter loading (differential pressure)can be done by measuring pressure with fluid in a new filter andcomparing it to the readings obtained during normal use. Pressurereadings can be obtained by using a pressure sensor in the pump, using aflow meter, monitoring the current on the motor, and/or with a pressuresensor located before the filter in the fluid path.

FIG. 31 depicts an alternative configuration wherein the filter islocated before the pre-reservoir 30 as well as the recirculationupstream of the filter 42. In particular, the recirculation returns to apoint upstream of the filter and downstream of an isolation valve. Inthis configuration, process fluid is pulled from the pumping chamber 34through the filter 42 and into the pre-reservoir 30. Alternatively, aventuri on the pre-reservoir drain can be used in combination with thegas volume detection system to fill the pre-reservoir from the filter42. The pre-reservoir 30 provides an extra degassing benefit from liquidbeing pulled through the filter 42. In addition, precise control of therecharge rate can also mitigate any gas introduction.

FIG. 32 depicts another configuration wherein the filter 42 is locatedafter the pre-reservoir 30 and the recirculation is located eitherupstream of the pre-reservoir 30, or downstream of the pre-reservoir(the latter alternative indicated by the valved path shown in phantom).Where the recirculation occurs upstream of the pre-reservoir 30, therecirculation line is coupled to a point upstream of the pre-reservoir30 and downstream of a closely-associated valve. Process fluid is pulledthrough the filter 42 directly during a recharge of the pump.Alternatively, when the valved path shown in phantom in FIG. 32 isimplemented, the recirculation line is coupled to a point upstream ofthe filter 42 and downstream of the pre-reservoir 30 and aclosely-associated valve. Process fluid is pulled through the filter 42directly during a recharge of the pump. This valved path shown inphantom allows for isolation of the pre-reservoir 30 and the filter 42so that the filter 42 can be automatically tested for problems, e.g.,unable to prime because of broken valve, leaking fitting (loss of seal).

FIG. 33 depicts another configuration wherein the filter 42 is alsolocated before the pre-reservoir but where the recirculation isdownstream of the filter 42. In particular, the recirculation returns toa point downstream of an isolation valve and upstream of thepre-reservoir 30, or directly into the top of the pre-reservoir 30.Process fluid is pulled from the pumping chamber 34 through the filter42 and into the pre-reservoir 30. Alternatively, the venturi on thepre-reservoir drain is used in combination with the gas volume detectionsystem to fill the pre-reservoir from the filter. The pre-reservoir 30provides an extra degassing benefit for the process fluid being pulledthrough the filter 42; again, precise control of the recharge rate canalso mitigate any gas introduction.

It should be understood that in all cases of FIGS. 31-33, thepre-reservoir 30 may include optional apparatus including:

-   -   (1) pre-reservoir 30 includes an inlet for a nitrogen blanket        (e.g., a low pressure supply of nitrogen that is        process-filtered);    -   (2) a valve on the nitrogen blanket supply to turn it off or        turn it on;    -   (3) a check valve on the pre-reservoir 30 drain line biased only        to allow flow out of the pre-reservoir. This check valve can be        located upstream or downstream of a typically-located drain        valve; and    -   (4) a venturi to supply vacuum to pull fluid out of the drain        line, or it may be needed to overcome any pressure differential        that would tend to push fluid back from the drain line into the        pre-reservoir 30. The venturi has a nitrogen supply that also        has a valve to turn off or turn on the nitrogen supply so that        the venturi is not running all of the time.

Self-Correcting Pump

As with any single or dual stage pump, if the unit has a problem it mayhave to be addressed during unscheduled maintenance time. There is aneed for a pump that has the ability to either self-repair/correct or tocontinue running until the scheduled maintenance time is available. Thisallows the pump to continue with production with the official downtimeoccurring during non-production or maintenance time. To accomplish this,the pump has the ability to measure the current applied to the pumpmotor. If the current increases over time with no change in the processsetup or chemical, this could be the result of a problem with the outputvalve, electronics, motor, chemical, or filter. The pump could signalthe operator that it needs to be looked at soon. If a flow meter isplaced after the filter and before the dispense output/suckback valve,it can determine if the valve has opened or closed correctly. If theflow has changed, it could signal the pump to adjust the flow rate tothe correct amount. If a flow meter is placed after the filter and afterthe dispense output/suckback valve, it can determine if the valve hasopened or closed correctly, as well as, if suckback occurred correctly.If there is an issue with suckback, the pump could open the dispensevalve slightly and then push or pull the fluid to bring the fluid backto the correct level. If the flow has changed for the dispense, it couldsignal the pump to adjust the flow rate to the correct amount.

While the invention has been described in detail and with reference tospecific embodiments thereof, it will be apparent to one skilled in theart that various changes and modifications can be made therein withoutdeparting from the spirit and scope thereof.

What is claimed is:
 1. An apparatus for remotely monitoring andcontrolling the operation of a tool in a semiconductor manufacturingprocess over a network, said apparatus comprising: at least onecomputer, remotely-located from said tool, in communication with saidnetwork, said computer comprising a web browser for communicating oversaid network; tool electronics that are in communication with saidnetwork; and a web server for establishing communication between said atleast one computer and said tool electronics over said network when saidat least one computer identifies said tool.
 2. The apparatus of claim 1wherein said communication between said at least one computer and saidtool electronics comprises status and control data.
 3. The apparatus ofclaim 1 wherein said web server is a surface mounted component.
 4. Theapparatus of claim 1 wherein said web server communicates with saidnetwork using an Ethernet protocol.
 5. The apparatus of claim 4 furthercomprising a power-over-Ethernet (POE) connection for connectingdevices.
 6. The apparatus of claim 5 further comprising a video devicethat is coupled to said POE connection for visually monitoring said toolor a vicinity of the tool.
 7. The apparatus of claim 6 wherein saidvideo device comprises a microphone and a speaker for supporting audiblecommunication in the vicinity of said tool.
 8. The apparatus of claim 1wherein said web server communicates with said network using a wirelessprotocol.
 9. The apparatus of claim 1 wherein said tool is a pump andwherein said tool electronics comprise electronically-activatable valvesand at least one sensor.
 10. A method for remotely monitoring andcontrolling the operation of a tool in a semiconductor manufacturingprocess over a network, said method comprising: (a) coupling at leastone computer, remotely-located from said tool, to be in communicationwith a network and wherein said computer comprises a web browser forcommunication over said network; (b) coupling tool electronics to be incommunication with said network; and (c) establishing communicationbetween said at least one computer and said tool electronics over saidnetwork using a web server when said at least one computer identifiessaid tool.
 11. The method of claim 10 wherein said step of communicatingwith said network comprises using an Ethernet protocol.
 12. The methodof claim 11 further comprising the step of providing apower-over-Ethernet (POE) connection for connecting devices thereto. 13.The method of claim 10 wherein one of said devices comprises a videodevice for monitoring said tool or a vicinity of the tool.
 14. Themethod of claim 13 further comprising the step of providing a microphoneand a speaker for supporting audible communication in the vicinity ofsaid tool.
 15. The method of claim 10 wherein said step of establishingcommunication comprises said web server communicating with said networkusing a wireless protocol.
 16. The method of claim 10 wherein said stepof communicating between said at least one computer and said toolelectronics comprises status and control data.
 17. The method of claim16 wherein said step of communicating between said at least one computerand said tool electronics comprises controlling operation of the tool.18. The method of claim 17 wherein said step of controlling saidoperation of said tool comprises controlling electronically-activatablevalves using at least one sensor input.